Prof. Hyunkyung Shim Profile

Prof. Hyunkyung Shim

at SK Hynix Inc

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 23 March 2012 Paper

Comparison study for 3x-nm contact hole CD uniformity between EUV lithography and ArF immersion double patterning

Keundo Ban, Junggun Heo, Hyunkyung Shim, Minkyung Park, Kilyoung Lee, Sunyoung Koo, Jaeheon Kim, Cheolkyu Bok, Myoungsoo Kim, Hyosang Kang

Proceedings Volume 8322, 83221A (2012) https://doi.org/10.1117/12.916119

KEYWORDS: Double patterning technology, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Line width roughness, Photomasks, Optical lithography, Etching, Metrology, Edge roughness

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Proceedings Article | 16 April 2011 Paper

Patterning process study for 30nm hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Byounghoon Lee, Jongsik Bang, Hyunkyung Shim, Sungjin Kim, James Moon, Donggyu Yim, Sung-Ki Park

Proceedings Volume 7972, 79720P (2011) https://doi.org/10.1117/12.880906

KEYWORDS: Optical lithography, Photomasks, Critical dimension metrology, Nanoimprint lithography, Chromium, Etching, Double patterning technology, Scanners, Image processing, Photoresist developing

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Proceedings Article | 31 March 2010 Paper

Mesh patterning process for 40nm contact hole

Kilyoung Lee, Cheolkyu Bok, Jaeheon Kim, Hyunkyung Shim, Junggun Heo, Junghyung Lee, Hyeong-Soo Kim, Donggu Yim, Sung-Ki Park

Proceedings Volume 7639, 76391S (2010) https://doi.org/10.1117/12.846388

KEYWORDS: Optical lithography, Double patterning technology, Image processing, Photoresist processing, Lithography, Etching, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Coating

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