Hyunmin Song
at Hanyang Univ
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 13 March 2015 Paper
Proceedings Volume 9422, 94222E (2015) https://doi.org/10.1117/12.2085755
KEYWORDS: Refractive index, Photons, Photoresist materials, Extreme ultraviolet lithography, Extreme ultraviolet, Critical dimension metrology, Stochastic processes, Line edge roughness, Optical properties, Lithography

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