Hyunsuk Bang
at Toppan Photomask Korea Ltd
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 8 November 2005 Paper
Proc. SPIE. 5992, 25th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Diffractive optical elements, Etching, Quartz, Ions, Atomic force microscopy, Photomasks, Critical dimension metrology, Reactive ion etching, Plasma, Phase shifts

Proceedings Article | 5 September 2001 Paper
Proc. SPIE. 4409, Photomask and Next-Generation Lithography Mask Technology VIII
KEYWORDS: Target detection, Lithography, Etching, Dry etching, Photomasks, Wet etching, Mask making, Critical dimension metrology, Semiconducting wafers, Standards development

Proceedings Article | 22 January 2001 Paper
Proc. SPIE. 4186, 20th Annual BACUS Symposium on Photomask Technology
KEYWORDS: Reticles, Logic, Etching, Dry etching, Image processing, Manufacturing, Transistors, Computer aided design, Critical dimension metrology, Overlay metrology

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