Dr. Ian M. McMackin
at Applied Materials
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 7 March 2014 Paper
Proceedings Volume 8974, 89740V (2014) https://doi.org/10.1117/12.2037415
KEYWORDS: Photomasks, Lithography, Antireflective coatings, Nanostructures, Reflectivity, Glasses, Cones, Optical lithography, Ultraviolet radiation, Refraction

SPIE Journal Paper | 1 July 2010
Sherjang Singh, Ssuwei Chen, Kosta Selinidis, Brian Fletcher, Ian McMackin, Ecron Thompson, Douglas Resnick, Peter Dress, Uwe Dietze
JM3, Vol. 9, Issue 03, 033003, (July 2010) https://doi.org/10.1117/12.10.1117/1.3462815

Proceedings Article | 18 March 2009 Paper
Proceedings Volume 7271, 72711W (2009) https://doi.org/10.1117/12.815014
KEYWORDS: Photomasks, Inspection, Metals, Semiconducting wafers, Scanning electron microscopy, Defect detection, Lithography, Electron beam lithography, Defect inspection, Wafer inspection

Proceedings Article | 18 March 2009 Paper
Sherjang Singh, Ssuwei Chen, Kosta Selinidis, Brian Fletcher, Ian McMackin, Ecron Thompson, Douglas Resnick, Peter Dress, Uwe Dietze
Proceedings Volume 7271, 72712H (2009) https://doi.org/10.1117/12.814290
KEYWORDS: Photomasks, Particles, Mask cleaning, Inspection, Lithography, Scanning electron microscopy, Photoresist processing, Nanoimprint lithography, Contamination, Semiconducting wafers

Proceedings Article | 17 October 2008 Paper
Proceedings Volume 7122, 71222K (2008) https://doi.org/10.1117/12.801948
KEYWORDS: Photomasks, Inspection, Metals, Lithography, Semiconducting wafers, Scanning electron microscopy, Defect inspection, Etching, Image segmentation, Ultraviolet radiation

Proceedings Article | 21 March 2008 Paper
Proceedings Volume 6921, 69211L (2008) https://doi.org/10.1117/12.773970
KEYWORDS: Photomasks, Inspection, Semiconducting wafers, Particles, Lithography, Defect inspection, Etching, Optical lithography, Image processing, Manufacturing

Proceedings Article | 16 November 2007 Paper
Proceedings Volume 6730, 67300F (2007) https://doi.org/10.1117/12.747565
KEYWORDS: Inspection, Semiconducting wafers, Lithography, Particles, Defect inspection, Ultraviolet radiation, Contamination, Ions, Image processing, Wafer inspection

Proceedings Article | 21 March 2007 Paper
J. Perez, K. Selinidis, S. Johnson, B. Fletcher, F. Xu, J. Maltabes, I. McMackin, D. Resnick, S. Sreenivasan
Proceedings Volume 6517, 65170L (2007) https://doi.org/10.1117/12.720673
KEYWORDS: Particles, Inspection, Lithography, Semiconducting wafers, Manufacturing, Photomasks, Optical lithography, Ultraviolet radiation, Defect detection, Silica

Proceedings Article | 23 March 2006 Paper
L. Jeff Myron, Ecron Thompson, Ian McMackin, Douglas Resnick, Tadashi Kitamura, Toshiaki Hasebe, Shinichi Nakazawa, Toshifumi Tokumoto, Eric Ainley, Kevin Nordquist, William Dauksher
Proceedings Volume 6151, 61510M (2006) https://doi.org/10.1117/12.659457
KEYWORDS: Inspection, Metals, Lithography, Silica, Logic, Semiconducting wafers, Defect detection, Photomasks, Chromium, Databases

Proceedings Article | 20 May 2004 Paper
Frank Xu, Nicholas Stacey, Mike Watts, Van Truskett, Ian McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, S. Sreenivasan, C. Grant Willson, Norman Schumaker
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538734
KEYWORDS: Lithography, Ultraviolet radiation, Silicon, Optical lithography, Liquids, Semiconducting wafers, Etching, Optical alignment, Scanning electron microscopy, Interfaces

Proceedings Article | 20 May 2004 Paper
Ian McMackin, Jin Choi, Philip Schumaker, Van Nguyen, Frank Xu, Ecron Thompson, Daniel Babbs, S. Sreenivasan, Mike Watts, Norman Schumaker
Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.538733
KEYWORDS: Ultraviolet radiation, Lithography, Semiconducting wafers, Liquids, Process control, Optical lithography, Optical alignment, Etching, Nanoimprint lithography, Line edge roughness

SPIE Journal Paper | 1 April 2004
JM3, Vol. 3, Issue 02, (April 2004) https://doi.org/10.1117/12.10.1117/1.1683261
KEYWORDS: Lithography, Printing, Etching, Semiconducting wafers, Photoresist processing, Image processing, Chromium, Distortion, Scanning electron microscopy, Silica

Proceedings Article | 17 December 2003 Paper
Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518307
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Printing, Lithography, Etching, Photoresist processing, Cadmium, Scanning electron microscopy, Quartz, Electron beam lithography

Proceedings Article | 16 June 2003 Paper
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484923
KEYWORDS: Semiconducting wafers, Lithography, Critical dimension metrology, Scanning electron microscopy, Quartz, Etching, Cadmium, Photomasks, Chromium, Photoresist processing

Proceedings Article | 16 June 2003 Paper
Ian McMackin, Philip Schumaker, Daniel Babbs, Jin Choi, Wenli Collison, S. Sreenivasan, Norman Schumaker, Michael Watts, Ronald Voisin
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490133
KEYWORDS: Semiconducting wafers, Etching, Ultraviolet radiation, Lithography, Liquids, Optical alignment, Particles, Critical dimension metrology, Scanning electron microscopy, Optical lithography

Proceedings Article | 12 July 2002 Paper
C. Thomas, Tracy Bahm, Larry Baylor, Philip Bingham, Steven Burns, Matt Chidley, Long Dai, Robert Delahanty, Christopher Doti, Ayman El-Khashab, Robert Fisher, Judd Gilbert, James Goddard, Gregory Hanson, Joel Hickson, Martin Hunt, Kathy Hylton, George John, Michael Jones, Ken Macdonald, Michael Mayo, Ian McMackin, Dave Patek, John Price, David Rasmussen, Louis Schaefer, Thomas Scheidt, Mark Schulze, Philip Schumaker, Bichuan Shen, Randall Smith, Allen Su, Kenneth Tobin, William Usry, Edgar Voelkl, Karsten Weber, Paul Jones, Robert Owen
Proceedings Volume 4692, (2002) https://doi.org/10.1117/12.475659
KEYWORDS: Holograms, Digital holography, Holography, Semiconducting wafers, Cameras, Deep ultraviolet, Spatial frequencies, Beam splitters, Digital video recorders, Fourier transforms

Proceedings Article | 8 September 1998 Paper
Michael Gregg, David Bossert, David Gallant, Ian McMackin, John Marciante, Malcolm Wright
Proceedings Volume 3380, (1998) https://doi.org/10.1117/12.327183
KEYWORDS: Semiconductor lasers, Fiber lasers, Semiconductors, Laser development, Diodes, Laser applications, Directed energy weapons, Optical amplifiers, Analytical research, Fiber amplifiers

Showing 5 of 17 publications
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