Dr. Ichiro Okabe Profile

Dr. Ichiro Okabe

Lithography Engineer at Intel Kabushiki Kaisha

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Publications (3)

Proceedings Article | 15 March 2012 Paper

Mesoscale simulation of the line-edge structure during positive and negative tone resist development process

Hiroshi Morita, Ichiro Okabe, Saurabh Agarwal, Vivek Singh

Proceedings Volume 8325, 83250J (2012) https://doi.org/10.1117/12.916389

KEYWORDS: Polymers, Line edge roughness, Particles, Photoresist materials, Photoresist processing, Calibration, Photoresist developing, Polymer thin films, Molecules, Lithography

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Proceedings Article | 23 June 2000 Paper

Temperature dependence of acid molecular diffusion in resist polymer films simulated by molecular dynamics

Minoru Toriumi, Ichiro Okabe, Takeshi Ohfuji, Masayuki Endo, Hiroaki Morimoto

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388269

KEYWORDS: Diffusion, Polymers, Polymethylmethacrylate, Molecules, Polymer thin films, Chemically amplified resists, Molecular interactions, Chemical species, Matrices, Chemical analysis

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Proceedings Article | 11 June 1999 Paper

Process margin in ArF lithography considering process window distortion

Ichiro Okabe, Takeshi Ohfuji, Masayuki Endo, Hiroaki Morimoto

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350271

KEYWORDS: Transparency, Lithography, Reflectivity, Photoresist processing, Distortion, Silicon, 193nm lithography, Resolution enhancement technologies, Bottom antireflective coatings, Refractive index

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