Dr. Igor V. Fomenkov
Fellow at ASML San Diego
SPIE Involvement:
Conference Program Committee | Author
Publications (55)

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 22 February 2021 Poster + Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Semiconductors, Scanners, Laser applications, Laser stabilization, Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Tin

Proceedings Article | 22 February 2021 Presentation
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII

Proceedings Article | 24 March 2020 Presentation
Proc. SPIE. 11323, Extreme Ultraviolet (EUV) Lithography XI

Proceedings Article | 9 September 2019 Presentation
Proc. SPIE. 11111, X-Ray Lasers and Coherent X-Ray Sources: Development and Applications XIII

Showing 5 of 55 publications
Conference Committee Involvement (3)
International Conference on Extreme Ultraviolet Lithography 2021
26 September 2021 | Monterey, California, United States
International Conference on Extreme Ultraviolet Lithography 2020
21 September 2020 | Online Only, California, United States
International Conference on Extreme Ultraviolet Lithography 2019
16 September 2019 | Monterey, California, United States
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