Dr. Ingo Höllein
at Advanced Mask Technology Ctr GmbH & Co KG
SPIE Involvement:
Author
Publications (10)

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Contamination, Crystals, Manufacturing, Humidity, Photomasks, Environmental sensing, Crystallography, Prototyping, Scanning tunneling microscopy

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Contamination, Dry etching, Crystals, Ions, Manufacturing, Pellicles, Photomasks, Semiconducting wafers, Scanning tunneling microscopy, Vacuum purge

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Metrology, Scanners, Manufacturing, Inspection, Printing, Wafer inspection, Photomasks, Critical dimension metrology, Semiconducting wafers, Defect inspection

Proceedings Article | 2 May 2008 Paper
Proc. SPIE. 6792, 24th European Mask and Lithography Conference
KEYWORDS: Lithography, Contamination, Sensors, Manufacturing, Time metrology, Humidity, Photomasks, Chromatography, Environmental sensing, Contamination control

Proceedings Article | 3 May 2007 Paper
Proc. SPIE. 6533, 23rd European Mask and Lithography Conference
KEYWORDS: Reticles, Contamination, Particles, Crystals, Ions, Photomasks, Chemical analysis, Analytical research, Semiconducting wafers, Standards development

Showing 5 of 10 publications
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