Ms. Irina Pundaleva Profile

Irina Pundaleva

Engineer at SAMSUNG Electronics Co Ltd

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Author

Publications (6)

Proceedings Article | 7 March 2008 Paper

Rigorous modeling and analysis of impact produced by microstructures in mask on wafer pattern fidelity

HeeBom Kim, MyoungSoo Lee, HanKu Cho, Irina Pundaleva, ByungGook Kim, Roman Chalykh

Proceedings Volume 6924, 69244H (2008) https://doi.org/10.1117/12.773203

KEYWORDS: Diffraction, Refractive index, Femtosecond phenomena, Quartz, Distortion, Transmittance, Photomasks, Semiconducting wafers, Pulsed laser operation, Binary data

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Proceedings Article | 12 May 2007 Paper

Scatterometry based profile metrology of two-dimensional patterns of EUV masks

Hanku Cho, Irina Pundaleva, Roman Chalykh, Byunggook Kim, Heebom Kim

Proceedings Volume 6607, 66070S (2007) https://doi.org/10.1117/12.728942

KEYWORDS: Diffraction, Metrology, Polarization, Scatterometry, 3D metrology, Photomasks, Extreme ultraviolet, Shape analysis, Extreme ultraviolet lithography, Scatter measurement

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Proceedings Article | 5 April 2007 Paper

Detailed analysis of capability and limitations of CD scatterometry measurements for 65- and 45-nm nodes

Roman Chalykh, SeongWoon Choi, JeungWoo Lee, Woosung Han, Irina Pundaleva

Proceedings Volume 6518, 65180V (2007) https://doi.org/10.1117/12.711233

KEYWORDS: Diffraction, Finite-difference time-domain method, Cadmium, Polarization, Scatterometry, Precision measurement, Process control, Photomasks, Critical dimension metrology, Scatter measurement

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Proceedings Article | 5 April 2007 Paper

Image analysis of alignment and overlay marks with compound structure

Han-Ku Cho, Jang-Ho Shin, Irina Pundaleva, Joo-Tae Moon, Seong-Sue Kim, Roman Chalykh

Proceedings Volume 6518, 65182D (2007) https://doi.org/10.1117/12.711277

KEYWORDS: Semiconductors, Antireflective coatings, Finite-difference time-domain method, Optical lithography, Coating, Image analysis, Image quality, Optical alignment, Semiconducting wafers, Overlay metrology

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Proceedings Article | 20 October 2006 Paper

Simulation of critical dimension and profile metrology based on scatterometry method

SeongSue Kim, Roman Chalykh, Han-Ku Cho, Irina Pundaleva, Joo-Tae Moon

Proceedings Volume 6349, 63491K (2006) https://doi.org/10.1117/12.688623

KEYWORDS: Diffraction, Metrology, Polarization, Light scattering, Magnetism, Scatterometry, Critical dimension metrology, Scatter measurement, Overlay metrology, Diffraction gratings

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Proceedings Article | 24 March 2006 Paper

Improved scatterometry method of critical dimension measurements and its application for control of development process

Hakseung Han, Irina Pundaleva, Dongseok Nam, Woosung Han, Donggun Lee

Proceedings Volume 6152, 61520G (2006) https://doi.org/10.1117/12.657324

KEYWORDS: Diffraction, Sensors, Spectroscopy, In situ metrology, Scatterometry, Time metrology, Process control, Photomasks, Critical dimension metrology, Diffraction gratings

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Showing 5 of 6 publications

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