Isaac Lee
Key Account Manager at MKS Instruments Inc
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 28 June 2013 Paper
Proc. SPIE. 8701, Photomask and Next-Generation Lithography Mask Technology XX
KEYWORDS: Reticles, Defect detection, Data modeling, Databases, Particles, Inspection, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, EUV optics

Proceedings Article | 20 March 2010 Paper
Proc. SPIE. 7636, Extreme Ultraviolet (EUV) Lithography
KEYWORDS: Reticles, Optical lithography, Defect detection, Inspection, Scanning electron microscopy, Photomasks, Extreme ultraviolet, Line edge roughness, Semiconducting wafers, Defect inspection

Proceedings Article | 17 October 2008 Paper
Proc. SPIE. 7122, Photomask Technology 2008
KEYWORDS: Reticles, Contamination, Stars, Defect detection, Sensors, Inspection, Photomasks, SRAF, Algorithm development, Semiconducting wafers

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Reticles, Defect detection, Detection and tracking algorithms, Opacity, Sensors, Image processing, Inspection, Photomasks, Critical dimension metrology, Resolution enhancement technologies

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Lithography, Reticles, Sensors, Databases, Inspection, Photoresist materials, Photomasks, Optical proximity correction, SRAF, Resolution enhancement technologies

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