Mr. Ivan L. Berry Profile

Ivan L. Berry

Director/Advanced Technology at Axcelis Technologies Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 17 March 2012 Paper

Photoresist strip challenges for advanced lithography at 20nm technology node and beyond

Ivan Berry, Carlo Waldfried, Dwight Roh, Shijian Luo, David Mattson, James DeLuca, Orlando Escorcia

Proceedings Volume 8328, 83280J (2012) https://doi.org/10.1117/12.918054

KEYWORDS: Plasmas, Silicon, Photoresist materials, Ions, Diffusion, Oxygen, Hydrogen, Arsenic, Chemistry, Oxidation

Read Abstract +

Proceedings Article | 11 June 1999 Paper

Effects of amines on postlithographic photo and thermal curing of deep-UV resists

Robert Mohondro, John Hallock, Ivan Berry, Roy Martinez

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350151

KEYWORDS: Deep ultraviolet, Etching, Photoresist processing, Nitrogen, Resistance, Ultraviolet radiation, Plasma etching, Oxygen, FT-IR spectroscopy, Signal attenuation

Read Abstract +

Proceedings Article | 1 September 1998 Paper

Ion projection lithography

John Melngailis, Hans Loschner, Gerhard Stengl, Ivan Berry, Alfred Mondelli, Gerhard Gross

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328849

KEYWORDS: Photomasks, Ions, Silicon, Semiconducting wafers, Distortion, Optical alignment, Ion beams, Lithography, Silicon carbide, Projection lithography

Read Abstract +

Proceedings Article | 5 June 1998 Paper

Analysis, design, and optimization of ion-beam lithography masks

Richard Tejeda, Roxann Engelstad, Edward Lovell, Ivan Berry

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309624

KEYWORDS: Photomasks, Distortion, Lithography, Ion beams, Silicon, Laser induced plasma spectroscopy, Optimization (mathematics), Kinematics, X-rays, Optical spheres

Read Abstract +

Proceedings Article | 13 May 1994 Paper

Ion projection: the successor to optical lithography

Hans Loeschne, Gerhard Stengl, Ivan Berry, John Randall, John Wolfe, Walter Finkelstein, Robert Hill, John Melngailis, Lloyd Harriott, Wilhelm Bruenger, L. Buchmann

Proceedings Volume 2194, (1994) https://doi.org/10.1117/12.175827

KEYWORDS: Ions, Semiconducting wafers, Photomasks, Lithography, Distortion, Projection systems, Wafer-level optics, Ion beams, Optical lithography, Projection lithography

Read Abstract +

Proceedings Article | 9 July 1992 Paper

Chromatic and spherical aberration correction in axially symmetric electrostatic lenses

Ivan Berry

Proceedings Volume 1671, (1992) https://doi.org/10.1117/12.136034

KEYWORDS: Chromatic aberrations, Lenses, Colorimetry, Electrodes, Monochromatic aberrations, Optical components, Ions, Objectives, Ray tracing, Geometrical optics

Read Abstract +

Showing 5 of 6 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years