Mr. Iwao Higashikawa Profile

Iwao Higashikawa

Photomask Integration Group at Toshiba Corp

SPIE Involvement:

Author

Publications (29)

Proceedings Article | 4 March 2010 Paper

In-situ Mueller matrix polarimetry of projection lenses for 193-nm lithography

Hiroshi Nomura, Iwao Higashikawa

Proceedings Volume 7640, 76400Q (2010) https://doi.org/10.1117/12.845973

KEYWORDS: Polarimetry, Photomasks, Polarization, Lithography, Polarizers, Semiconducting wafers, Lithographic illumination, Lenses, Mueller matrices, Wafer-level optics

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Proceedings Article | 11 December 2009 Paper

Mueller matrix polarimetry for immersion lithography tools with a polarization monitoring system at the wafer plane

Hiroshi Nomura, Iwao Higashikawa

Proceedings Volume 7520, 752012 (2009) https://doi.org/10.1117/12.837031

KEYWORDS: Polarimetry, Polarization, Semiconducting wafers, Photomasks, Polarizers, Immersion lithography, Lithography, Lithographic illumination, Optical components, Calcite

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Proceedings Article | 12 May 2005 Paper

Development of fluoropolymers for pellicle in 157nm lithography

Shinji Okada, Hiromasa Yamamoto, Ikuo Matsukura, Naoko Shirota, Yuichirou Ishibashi, Hironao Sasaki, Iwao Higashikawa, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599311

KEYWORDS: Polymers, Fluorine, Transparency, Pellicles, Lithography, 193nm lithography, Hydrogen, FT-IR spectroscopy, Manufacturing, Polymerization

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Proceedings Article | 20 August 2004 Paper

Actinic aerial image measurement for qualification of defect on 157-nm photomask

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Wolfgang Degel, Klaus Boehm, Axel Zibold, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Silvio Teuber Semmler

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557762

KEYWORDS: Photomasks, Lithography, Semiconducting wafers, Semiconductors, Metrology, Wafer-level optics, Image quality, Lithographic illumination, CCD cameras, Binary data

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Proceedings Article | 20 August 2004 Paper

The guideline of reticle data management

Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, Nobuyuki Yoshioka

Proceedings Volume 5446, (2004) https://doi.org/10.1117/12.557741

KEYWORDS: Photomasks, Reticles, Data modeling, Manufacturing, Semiconducting wafers, Image processing, Standards development, Design for manufacturability, Information technology, System on a chip

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Proceedings Article | 2 June 2004 Paper

The guideline of reticle data management (Ver. 2)

Nobuyuki Iriki, Norihiko Miyazaki, M. Homma, T. Sato, Toshio Onodera, T. Matsuda, T. Uga, Hidehiro Higashino, Iwao Higashikawa, Nobuyuki Yoshioka

Proceedings Volume 5504, (2004) https://doi.org/10.1117/12.568028

KEYWORDS: Reticles, Photomasks, Manufacturing, Semiconducting wafers, Design for manufacturability, Standards development, Data modeling, Electronic design automation, System on a chip, Semiconductors

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Proceedings Article | 28 May 2004 Paper

First results from AIMS beta tool for 157-nm lithography

Silvio Teuber, Iwao Higashikawa, Jan-Peter Urbach, Christof Schilz, Roderick Koehle, Axel Zibold

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536670

KEYWORDS: Photomasks, Phase shifts, Semiconducting wafers, Optical resolution, Lithography, Etching, Binary data, Wafer-level optics, CCD image sensors, Optical simulations

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Proceedings Article | 17 December 2003 Paper

Development of phase-shift and transmittance metrology system for 157-nm PSMs

Hal Kusunose, Takashi Yasui, Iwao Higashikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.518033

KEYWORDS: Transmittance, Phase measurement, Photomasks, Interferometers, Quartz, Lithography, Ultraviolet radiation, Deep ultraviolet, Charge-coupled devices, Metrology

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Proceedings Article | 17 December 2003 Paper

Mask cost and specification

Hisashi Watanabe, Iwao Higashikawa

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.537878

KEYWORDS: Photomasks, Optical proximity correction, Inspection, Lithography, Deep ultraviolet, Manufacturing, Binary data, Semiconducting wafers, Yield improvement, Critical dimension metrology

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Proceedings Article | 28 August 2003 Paper

Development of pellicle for F2(157-nm) excimer laser

Shigeto Shigematsu, Toshihiko Nakano, H. Shigemoto, Masahiro Kondo, Hiroaki Nakagawa, H. Sasaki, Iwao Higashikawa

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504266

KEYWORDS: Transmittance, Polymers, Pellicles, Excimer lasers, Oxygen, Molecules, Absorption, Glasses, Nitrogen, Organic materials

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Proceedings Article | 28 August 2003 Paper

Actinic aerial image measurement tool for 157-nm mask qualification

Takashi Yasui, Iwao Higashikawa, Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Yuji Kobiyama, Jan-Peter Urbach, Christof Schilz, Armin Semmler

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504215

KEYWORDS: Photomasks, Binary data, CCD image sensors, CCD cameras, Image quality, Semiconducting wafers, Vacuum ultraviolet, Lithography, Vibration control, Optical resolution

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Proceedings Article | 28 August 2003 Paper

Actinic aerial image measurement tool for 157-nm lithography

Peter Kuschnerus, Thomas Engel, Axel Zibold, Claudia Hertfelder, Takashi Yasui, Iwao Higashikawa, Christof Schilz, Armin Semmler

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504064

KEYWORDS: Photomasks, Lithography, Lithographic illumination, Reticles, Binary data, CCD cameras, Semiconducting wafers, Printing, Optical alignment, Charge-coupled devices

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Proceedings Article | 26 June 2003 Paper

Guideline of reticle data management

Norihiko Miyazaki, N. Iriki, M. Homma, T. Sato, M. Mori, Tadashi Imoriya, Toshio Onodera, T. Matsuda, Hidehiro Higashino, K. Okuda, Iwao Higashikawa, Nobuyuki Yoshioka

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.484438

KEYWORDS: Photomasks, Reticles, Data modeling, Manufacturing, Semiconducting wafers, Image processing, Standards development, Design for manufacturability, Information technology, System on a chip

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Proceedings Article | 27 December 2002 Paper

Aerial image measurement system for 157-nm lithography

Klaus Eisner, Peter Kuschnerus, Jan-Peter Urbach, Christof Schilz, Thomas Engel, Axel Zibold, Takashi Yasui, Iwao Higashikawa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467353

KEYWORDS: Photomasks, Lithography, Phase shifts, CCD cameras, Vacuum ultraviolet, Binary data, CCD image sensors, Microelectronics, Reticles, Lithographic illumination

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Proceedings Article | 22 January 2001 Paper

Management of pattern generation system based on i-line stepper

Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410728

KEYWORDS: Photomasks, Lithography, Critical dimension metrology, Semiconducting wafers, Opacity, Optical proximity correction, Optical lithography, Error analysis, Inspection, Chromium

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Proceedings Article | 22 January 2001 Paper

New concept photomask repeater with stitching exposure technique

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410713

KEYWORDS: Reticles, Photomasks, Manufacturing, Critical dimension metrology, System on a chip, Optical lithography, Terbium, Optical alignment, Semiconducting wafers, Optical proximity correction

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Proceedings Article | 19 July 2000 Paper

Phase defects on DUV alternating PSMs

Ikuo Yoneda, Hideki Kanai, Shinji Yamaguchi, Iwao Higashikawa

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392097

KEYWORDS: Inspection, Defect inspection, Phase shifts, Photomasks, Deep ultraviolet, Defect detection, Quartz, Lithography, Printing, Semiconducting wafers

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Proceedings Article | 19 July 2000 Paper

New-concept i-line stepper for mask fabrication

Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate, Suigen Kyoh, Satoshi Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392077

KEYWORDS: Reticles, Photomasks, Critical dimension metrology, Manufacturing, System on a chip, Optical proximity correction, Mask making, Semiconducting wafers, Digital signal processing, Fabrication

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Proceedings Article | 19 July 2000 Paper

New photomask pattern generation method based on i-line stepper

Suigen Kyoh, Shun-Ichiro Tanaka, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Yuuki Ishii, Nobutaka Magome, Toshikazu Umatate

Proceedings Volume 4066, (2000) https://doi.org/10.1117/12.392096

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Critical dimension metrology, System on a chip, Lithography, Printing, Kinematics, Scanning electron microscopy, Process engineering

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Proceedings Article | 5 July 2000 Paper

New pattern generation system based on i-line stepper: photomask repeater

Suigen Kyoh, Soichi Inoue, Iwao Higashikawa, Ichiro Mori, Katsuya Okumura, Nobuyuki Irie, Koji Muramatsu, Nobutaka Magome

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389056

KEYWORDS: Photomasks, Critical dimension metrology, System on a chip, Semiconducting wafers, Lithography, Kinematics, Optical lithography, Printing, Optical components, Optical filters

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Proceedings Article | 25 August 1999 Paper

Resist heating effect on 50-KeV EB mask writing

Hideaki Sakurai, Takayuki Abe, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Iwao Higashikawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360210

KEYWORDS: Critical dimension metrology, Electron beams, Photomasks, Chemically amplified resists, Diffusion, Error analysis, Standards development, Semiconductors, Optical simulations, Mask making

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Proceedings Article | 25 August 1999 Paper

Inspection and printability of programmed defects on reticles for 0.200- and 0.175-um rule devices

Shinji Yamaguchi, Hideki Kanai, Haruki Komano, Hideaki Sakurai, Takehiro Kondo, Masamitsu Itoh, Ichiro Mori, Iwao Higashikawa

Proceedings Volume 3748, (1999) https://doi.org/10.1117/12.360229

KEYWORDS: Critical dimension metrology, Photomasks, Inspection, Opacity, Lithography, Scanning electron microscopy, Defect detection, Semiconducting wafers, Tolerancing, Reticles

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Proceedings Article | 1 September 1998 Paper

Process optimization for mask fabrication

Hideaki Sakurai, Masamitsu Itoh, Akitoshi Kumagae, Hirohito Anze, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 3412, (1998) https://doi.org/10.1117/12.328799

KEYWORDS: Photomasks, Photoresist processing, Mask making, Electron beams, Chemically amplified resists, Quartz, Error analysis, Critical dimension metrology, X-ray technology, Coating

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Proceedings Article | 28 July 1997 Paper

Focused-ion-beam (FIB) etching of quartz and carbon for Levenson mask repair

Hiroko Nakamura, Haruki Komano, Iwao Higashikawa

Proceedings Volume 3096, (1997) https://doi.org/10.1117/12.277284

KEYWORDS: Etching, Transmittance, Sputter deposition, Gallium, Phase shifts, Laser processing, Ions, Quartz, Photomasks, Carbon

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Proceedings Article | 12 February 1997 Paper

Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam

Shusuke Yoshitake, Yoji Ogawa, Hideaki Sakurai, Masamitsu Itoh, Iwao Higashikawa, Noriaki Nakayamada, Kazuto Matsuki, Shuichi Tamamushi

Proceedings Volume 3236, (1997) https://doi.org/10.1117/12.301200

KEYWORDS: Chromium, Beam shaping, Photomasks, Reactive ion etching, Critical dimension metrology, Etching, Semiconductors, Reticles, Optical lithography, Quartz

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Proceedings Article | 24 July 1996 Paper

Evaluation of phase and transmittance error on deep-UV halftone phase-shift mask

Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Akiko Yamada, Iwao Higashikawa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245248

KEYWORDS: Phase shifts, Transmittance, Photomasks, Halftones, Semiconducting wafers, Critical dimension metrology, Deep ultraviolet, Optical properties, Error analysis, Microelectronics

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Proceedings Article | 24 July 1996 Paper

Focused ion-beam imaging of defects on deep-UV single-layer halftone masks

Hiroko Nakamura, Haruki Komano, Kazuyoshi Sugihara, T. Koike, Iwao Higashikawa

Proceedings Volume 2793, (1996) https://doi.org/10.1117/12.245222

KEYWORDS: Image filtering, Halftones, Digital filtering, Deep ultraviolet, Ion beams, Transmittance, Optical filters, Silicon, Chromium, Quartz

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Proceedings Article | 27 May 1996 Paper

CD uniformity of photomasks written with high-voltage variable-shaped e beam

Noriaki Nakayamada, Shigehiro Hara, Toshiyuki Magoshi, Hideaki Sakurai, Takayuki Abe, Iwao Higashikawa

Proceedings Volume 2723, (1996) https://doi.org/10.1117/12.240462

KEYWORDS: Vestigial sideband modulation, Photomasks, Calibration, Critical dimension metrology, Laser scattering, Scattering, Error analysis, Electron beam lithography, Optics manufacturing, Photoresist processing

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Proceedings Article | 8 December 1995 Paper

Deep-UV attenuated phase-shift mask for a quarter-micrometer photolithography

Suigen Kyoh, Hideaki Sakurai, Takayuki Iwamatsu, Iwao Higashikawa, Rikiya Taniguchi, Hidehiro Watanabe, Takashi Tuchiya

Proceedings Volume 2621, (1995) https://doi.org/10.1117/12.228183

KEYWORDS: Photomasks, Phase shifts, Transmittance, Deep ultraviolet, Printing, Semiconducting wafers, Optical lithography, Optical fabrication, Attenuators, Lithography

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Showing 5 of 29 publications

Conference Committee Involvement (3)

Photomask and Next-Generation Lithography Mask Technology XI

14 April 2004 | Yokohama, Japan

Photomask and NGL Mask Technology X

16 April 2003 | Yokohama, Japan

Symposium on Photomask and X-Ray Mask Technology

18 April 1996 | Kawasaki City, Japan

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