Ms. Izumi Santo Profile

Izumi Santo

Manager at Holon Co Ltd

SPIE Involvement:

Author

Publications (5)

Proceedings Article | 16 October 2017 Paper

Micro-defect repair assisted with contour-based 2D metrology

Irene Shi, Eric Guo, Max Lu, Izumi Santo

Proceedings Volume 10451, 104511U (2017) https://doi.org/10.1117/12.2280505

KEYWORDS: Photomasks, Metrology, Semiconducting wafers, Manufacturing, Etching, Visualization, Data analysis

Read Abstract +

Proceedings Article | 4 October 2016 Paper

The CD control improvement by using CDSEM 2D measurement of complex OPC patterns

William Chou, Jeffrey Cheng, Adder Lee, James Cheng, Alex Tzeng, Colbert Lu, Ray Yang, Hong Jen Lee, Hideaki Bandoh, Izumi Santo, Hao Zhang, Chien Kang Chen

Proceedings Volume 9985, 99851M (2016) https://doi.org/10.1117/12.2241326

KEYWORDS: Photomasks, Critical dimension metrology, Optical proximity correction, Scanning electron microscopy, Semiconducting wafers, Manufacturing, Holons, Lithography, Edge roughness, Source mask optimization

Read Abstract +

Proceedings Article | 2 April 2014 Paper

Accurate contour extraction from mask SEM image

Izumi Santo, Akira Higuchi, Mirai Anazawa, Hideaki Bandoh

Proceedings Volume 9050, 90502M (2014) https://doi.org/10.1117/12.2046530

KEYWORDS: Photomasks, Scanning electron microscopy, Distortion, Lithography, Optical proximity correction, Ions, Image processing, Holons, Feature extraction, Edge roughness

Read Abstract +

Proceedings Article | 9 November 2005 Paper

CD measurement of angled lines on high-end masks and its calibration method

Masashi Ataka, Yasunobu Kitayama, Katsuyuki Takahashi, Naoyuki Nakamura, Izumi Santo, Hitomi Satoh, Norimichi Anazawa

Proceedings Volume 5992, 59924H (2005) https://doi.org/10.1117/12.632016

KEYWORDS: Critical dimension metrology, Calibration, Holons, Computer aided design, Standards development, Prototyping, Reliability, Data conversion, Optical proximity correction, Very large scale integration

Read Abstract +

Proceedings Article | 27 December 2002 Paper

Calibration and long-term stability evaluation of photomask CD-SEM utilizing JQA standard

Izumi Santo, Masashi Ataka, Katsuyuki Takahashi, Norimiti Anazawa

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468088

KEYWORDS: Calibration, Line edge roughness, Time metrology, Photomasks, Optical testing, Critical dimension metrology, Statistical analysis, Reticles, Edge roughness, Wafer-level optics

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years