J. Fung Chen
GM at Applied Maerials
SPIE Involvement:
Publications (92)

Proceedings Article | 19 May 2008 Paper
Proc. SPIE. 7028, Photomask and Next-Generation Lithography Mask Technology XV
KEYWORDS: Wafer-level optics, Lithography, Data modeling, Calibration, 3D modeling, Finite element methods, Photomasks, Optical proximity correction, Semiconducting wafers, Performance modeling

Proceedings Article | 12 March 2008 Paper
Proc. SPIE. 6924, Optical Microlithography XXI
KEYWORDS: Lithography, Polarization, Calibration, Manufacturing, Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Computational lithography, Optical proximity correction, Resolution enhancement technologies

Proceedings Article | 4 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Mathematical modeling, Lithography, Data modeling, Imaging systems, Calibration, Image processing, Design for manufacturing, Photomasks, Optical proximity correction, Statistical modeling

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Optical lithography, Etching, Manufacturing, Printing, Photomasks, Double patterning technology, Optical proximity correction, Critical dimension metrology, Photoresist processing, Model-based design

Proceedings Article | 20 May 2006 Paper
Proc. SPIE. 6283, Photomask and Next-Generation Lithography Mask Technology XIII
KEYWORDS: Lithography, Diffraction, Optical lithography, Metals, Manufacturing, Printing, Photomasks, Optical proximity correction, Nanoimprint lithography, Resolution enhancement technologies

Showing 5 of 92 publications
Conference Committee Involvement (4)
Photomask Technology
18 September 2007 | Monterey, California, United States
Photomask Technology
19 September 2006 | Monterey, California, United States
Photomask Technology
3 October 2005 | Monterey, California, United States
Photomask Technology
14 September 2004 | Monterey, California, United States
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