Mr. J. Gordon Hughes Profile

J. Gordon Hughes

CAD Systems Manager at Compugraphics International Ltd

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Author

Publications (5)

Proceedings Article | 17 December 2003 Paper

EMPOF: electronic mask production order forms

J. Gordon Hughes, David Muir, Leslie Drennan

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517507

KEYWORDS: Photomasks, Manufacturing, Software development, Databases, Data processing, Data conversion, Internet, Standards development, Computed tomography, Human-machine interfaces

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Proceedings Article | 2 June 2003 Paper

Practical DUV lithography for the optoelectronics market

Paul Harris, Martin McCallum, David Muir, Gordon Hughes, Stuart Pinkney

Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.482810

KEYWORDS: Deep ultraviolet, Reticles, Semiconducting wafers, Optical alignment, Lithography, Scanners, Overlay metrology, Metrology, Computer aided design, Critical dimension metrology

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Proceedings Article | 28 May 2003 Paper

Fully automated CD: metrology and mask inspection in a mask production environment using the MueTec DUV tool

Gerd Scheuring, Alexander Petrashenko, Stefan Doebereiner, Frank Hillmann, Hans-Jurgen Bruck, Andrew Hourd, Anthony Grimshaw, Gordon Hughes, Shiuh-Bin Chen, Parkson Chen, Thomas Schatz, Thomas Struck, Paul van Adrichem, Herman Boerland, Sigrid Lehnigk

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515107

KEYWORDS: Photomasks, Critical dimension metrology, Reticles, Inspection, Deep ultraviolet, Metrology, Binary data, Objectives, Environmental sensing, Cameras

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Proceedings Article | 27 December 2002 Paper

Automated management of photomask inspection

J. Gordon Hughes, Dave Muir

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467577

KEYWORDS: Inspection, Photomasks, Pellicles, Manufacturing, Defect inspection, Databases, Computed tomography, Reticles, Control systems, Optoelectronics

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Proceedings Article | 11 March 2002 Paper

Automation techniques for the handling of photomask data

J. Gordon Hughes, Leslie Drennan

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458292

KEYWORDS: Photomasks, Data processing, Manufacturing, Software development, Computed tomography, Data conversion, Computer programming, Operating systems, Computer programming languages, Databases

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