Advisory Engineer/Scientist at IBM Research in Albany, NY since 2016. Research focus: semiconductor material and process technology. Currently working on advanced patterning for N7 and B7 technology enablement and patterning fundamental study, including materials performance improvement and novel patterning processes. Ph.D. in Chemistry from UMASS Amherst.
Fundamental characterization of stochastic variation for improved single-expose extreme ultraviolet patterning at aggressive pitch
Fundamental characterization of stochastic variation for improved single-expose EUV patterning at aggressive pitch
Computational enablement for designs with sub-20nm metal tip to tip using cut shapes from grapho-epitaxy directed self-assembly
Electrical study of DSA shrink process and CD rectification effect at sub-60nm using EUV test vehicle