Mr. Jacob R. Zeuske Profile

Jacob R. Zeuske

Research Assistant at Univ of Wisconsin-Madison

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Author

Publications (4)

Proceedings Article | 27 May 2009 Paper

Mounting methodologies to measure EUV reticle nonflatness

Venkata Siva Battula, Jacob Zeuske, Roxann Engelstad, Pradeep Vukkadala, Andrew Mikkelson, Chris Van Peski

Proceedings Volume 7470, 747014 (2009) https://doi.org/10.1117/12.835202

KEYWORDS: Reticles, Extreme ultraviolet lithography, Photomasks, Interferometry, Photography, Computer aided design, Interferometers, Extreme ultraviolet, Beam expanders, Lithography

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Proceedings Article | 18 March 2009 Paper

Characterization of electrostatic chucks for extreme ultraviolet lithography

Tom Mulholland, Jacob Zeuske, Pradeep Vukkadala, Roxann Engelstad

Proceedings Volume 7271, 72713L (2009) https://doi.org/10.1117/12.814968

KEYWORDS: Reticles, Extreme ultraviolet lithography, Extreme ultraviolet, Photomasks, Dielectrics, Photography, Particles, Fourier transforms, Protactinium, Semiconductors

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Proceedings Article | 2 May 2008 Paper

Status of EUVL reticle chucking

Roxann Engelstad, Jaewoong Sohn, Jacob Zeuske, Venkata Siva Battula, Pradeep Vukkadala, Chris Van Peski, Kevin Orvek, Kevin Turner, Andrew Mikkelson, Madhura Nataraju

Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

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Proceedings Article | 30 October 2007 Paper

Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Roxann Engelstad, Kevin Turner, Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Venkata Siva Battula, Pradeep Vukkadala, Jacob Zeuske, Chris Van Peski

Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842

KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

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