Jae-Cheon Shin
at SK Hynix Inc
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Lithography, Etching, Chromium, Image analysis, Transmittance, Photomasks, Extreme ultraviolet, Nanoimprint lithography, Semiconducting wafers, Binary data

Proceedings Article | 26 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Reticles, Scanners, Manufacturing, Inspection, Reflectivity, Scanning electron microscopy, Data processing, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 30 October 2007 Paper
Proc. SPIE. 6730, Photomask Technology 2007
KEYWORDS: Semiconductors, Electron beams, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Process control, Photomasks, Critical dimension metrology

Proceedings Article | 20 October 2006 Paper
Proc. SPIE. 6349, Photomask Technology 2006
KEYWORDS: Electron beam lithography, Etching, Dry etching, Reliability, Chromium, Scanning electron microscopy, Photomasks, Critical dimension metrology, Photoresist processing, Phase shifts

Proceedings Article | 20 August 2004 Paper
Proc. SPIE. 5446, Photomask and Next-Generation Lithography Mask Technology XI
KEYWORDS: Semiconductors, Electron beam lithography, Manufacturing, Photomasks, Mask making, Critical dimension metrology, Halftones, Photoresist processing, Semiconducting wafers, Phase shifts

Showing 5 of 6 publications
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