Mr. Jae-Hwan Kim Profile

Jae-Hwan Kim

at Semiconductor Leading Edge Technologies Inc

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 26 June 2003 Paper

Wavefront aberration measurement in 157-nm high numerical aperture lens

Jaehwan Kim, Toshifumi Suganaga, Kunio Watanabe, Noriyoshi Kanda, Toshiro Itani, Julian Cashmore, Malcolm Gower

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485322

KEYWORDS: Photomasks, Monochromatic aberrations, Computer aided design, Lithography, Wavefronts, Wavefront aberrations, Critical dimension metrology, Semiconducting wafers, Reticles, Semiconductors

Read Abstract +

Proceedings Article | 26 June 2003 Paper

157-nm lithography for 65-nm node SRAM-gate

Toshifumi Suganaga, Shigeo Irie, Seiro Miyoshi, Jae-Hwan Kim, Kunio Watanabe, Eiji Kurose, Takamitsu Furukawa, Takuya Hagiwara, Toshiyuki Ishimaru, Toshiro Itani

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485376

KEYWORDS: Optical proximity correction, Lithography, Transmittance, Photoresist processing, Resolution enhancement technologies, Silicon, Reactive ion etching, Photomasks, Monochromatic aberrations, Optical simulations

Read Abstract +

SPIE Journal Paper | 1 October 2002

157 nm lithography with high numerical aperture lens for the 70 nm technology node

Toshifumi Suganaga, Noriyoshi Kanda, Jae-Hwan Kim, Osamu Yamabe, Kunio Watanabe, Takamitsu Furukawa, Seiro Miyoshi, Toshiro Itani, Julian Cashmore, Malcolm Gower

JM3, Vol. 1, Issue 03, (October 2002) https://doi.org/10.1117/12.10.1117/1.1501565

KEYWORDS: Birefringence, Lithography, Monochromatic aberrations, Semiconducting wafers, Imaging systems, Resolution enhancement technologies, Reticles, Wavefronts, Photomasks, Computer aided design

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years