Dr. Jae-Hee Hwang
at SK Hynix Inc
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 26 March 2019 Presentation
Proc. SPIE. 10959, Metrology, Inspection, and Process Control for Microlithography XXXIII
KEYWORDS: Metrology, Printing, Extreme ultraviolet lithography, Critical dimension metrology, Semiconducting wafers, Failure analysis

Proceedings Article | 4 April 2017 Presentation + Paper
Proc. SPIE. 10148, Design-Process-Technology Co-optimization for Manufacturability XI
KEYWORDS: Lithography, Optical lithography, Atrial fibrillation, Image processing, Manufacturing, Photomasks, Source mask optimization, Optical proximity correction, Semiconducting wafers

Proceedings Article | 24 March 2016 Paper
Proc. SPIE. 9778, Metrology, Inspection, and Process Control for Microlithography XXX
KEYWORDS: Target detection, Diffraction, Metrology, Optical lithography, Error analysis, Electron microscopes, Scanning electron microscopy, Optical proximity correction, Critical dimension metrology, Overlay metrology

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