Prof. Jae W. Hahn Profile

Prof. Jae W. Hahn

Professor at Yonsei Univ

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Author

Publications (28)

Proceedings Article | 20 August 2020 Presentation

Pattern quality analysis in a digital lithography system using scanning point array method

Changmin Lee, Yunhyeok Ko, Jae Hahn

Proc. SPIE. 11484, Optical Modeling and Performance Predictions XI

KEYWORDS: Lithography, Electron beam lithography, Mirrors, Optical lithography, Photomasks, Digital micromirror devices, Zone plates, Semiconducting wafers

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Proceedings Article | 19 August 2020 Presentation

Characterization of position and two-dimensional profiles of high-density beam spot array for digital lithography system

Yunhyeok Ko, Changmin Lee, Jae Hahn

Proc. SPIE. 11509, Optics and Photonics for Information Processing XIV

KEYWORDS: Lithography, Optical lithography, Lenses, Inspection, Optical testing, Photomasks, Charge-coupled devices, Beam shaping, Digital micromirror devices, Optical filtering

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Proceedings Article | 4 March 2019 Presentation

Analytical model for designing a high-energy-efficiency granular double-layer X-ray scintillator with a diffuse reflection layer (Conference Presentation)

Jookwon Song, Hyeon Bo Shim, Jae Hahn

Proc. SPIE. 10870, Design and Quality for Biomedical Technologies XII

KEYWORDS: Energy efficiency, Particles, X-rays, Scintillators, Diagnostics, Monte Carlo methods, Analytical research, Spatial resolution, X-ray imaging, Performance modeling

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SPIE Journal Paper | 15 November 2017

Pixel-based learning method for an optimized photomask in optical lithography

Moongyu Jeong, Jae Hahn

JM3 Vol. 16 Issue 04

KEYWORDS: Photomasks, Optical lithography, Source mask optimization, SRAF, Detection and tracking algorithms, Photovoltaics, Semiconducting wafers, Optical proximity correction, Computer simulations, Model-based design

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Proceedings Article | 25 September 2017 Presentation

Optimized modeling of powder-based x-ray scintillator screen for improved total efficiency by double-layer scintillator design (Conference Presentation)

Jookwon Song, Hyeon Bo Shim, Jae Hahn

Proc. SPIE. 10393, Radiation Detectors in Medicine, Industry, and National Security XVIII

KEYWORDS: Fabrication, Energy efficiency, Visible radiation, Particles, X-rays, Scintillators, Manufacturing, Image resolution, Image quality, Absorption

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Proceedings Article | 19 September 2017 Presentation

Spectrum modeling of mid-infrared flare considering realistic measurement environment (Conference Presentation)

Kiwook Han, Wondong Lee, Jae Hahn

Proc. SPIE. 10403, Infrared Remote Sensing and Instrumentation XXV

KEYWORDS: Mid-IR, Data modeling, Databases, Infrared spectroscopy, Emission spectroscopy, Transmittance, Infrared radiation, Molecular spectroscopy, Environmental sensing, Thermodynamics

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Proceedings Article | 12 December 2016 Presentation

An infrared metamaterial selective absorber with emitter considering atmospheric absorption for low observability (Conference Presentation)

Jagyeong Kim, Kiwook Han, Jae Hahn

Proc. SPIE. 9973, Infrared Remote Sensing and Instrumentation XXIV

KEYWORDS: Infrared detectors, Metamaterials, Atmospheric laser remote sensing, Electromagnetic radiation, Infrared radiation, Missiles, Structural design, Atmospheric sensing, Atmospheric modeling, Absorption

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Proceedings Article | 17 November 2016 Paper

Improvement of photomask CD uniformity using spatially resolved optical emission spectroscopy

Junhwa Jung, Youngkeun Kim, Il-Yong Jang, Byung-Gook Kim, Chan-Uk Jeon, Minwook Kang, Changmin Lee, Jae Hahn

Proc. SPIE. 9985, Photomask Technology 2016

KEYWORDS: Etching, Argon, Dry etching, Chromium, Emission spectroscopy, Photomasks, Plasma etching, Critical dimension metrology, Chlorine, Plasma

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Proceedings Article | 3 November 2016 Presentation

Minimum energy of silver and copper nanoparticles for laser sintering (Conference Presentation)

Changmin Lee, Jae Hahn

Proc. SPIE. 9927, Nanoengineering: Fabrication, Properties, Optics, and Devices XIII

KEYWORDS: Electronics, Optical lithography, Nanoparticles, Metals, Particles, Copper, Silver, Manufacturing, Analytical research, Laser sintering

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SPIE Journal Paper | 17 March 2016

Prediction of biases for optical proximity correction through partial coherent identification

Moongyu Jeong, Jae Hahn

JM3 Vol. 15 Issue 01

KEYWORDS: Optical proximity correction, Bismuth, Lawrencium, Image segmentation, Model-based design, Detection and tracking algorithms, Neural networks, Optical lithography, Solids, Evolutionary algorithms

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Proceedings Article | 9 January 2015 Paper

Development of optical inspection system for detecting malfunctions of digital micromirror device

Minwook Kang, Dong Won Kang, Wondong Lee, Jae Hahn

Proc. SPIE. 9444, International Seminar on Photonics, Optics, and Its Applications (ISPhOA 2014)

KEYWORDS: Mirrors, Optical lithography, Image segmentation, Inspection, Optical inspection, Micromirrors, Photomasks, Charge-coupled devices, Maskless lithography, Digital micromirror devices

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Proceedings Article | 9 January 2015 Paper

A mid-IR optical emission spectrometer with a PbSe array detector for analyzing spectral characteristic of IR flares

Wondong Lee, Minwook Kang, Jae Hahn

Proc. SPIE. 9444, International Seminar on Photonics, Optics, and Its Applications (ISPhOA 2014)

KEYWORDS: Infrared sensors, Mid-IR, Sensors, Spectroscopy, Infrared spectroscopy, Detector arrays, Black bodies, Infrared signatures, Infrared countermeasures, Diffraction gratings

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SPIE Journal Paper | 18 December 2014

Analysis of line-edge roughness due to the stick/slip motion of a contact-mode scanning probe in plasmonic lithography

Changhoon Park, Jinhee Jang, Jae Hahn

JM3 Vol. 13 Issue 04

KEYWORDS: Motion analysis, Lithography, Plasmonics, Motion models, Line edge roughness, Molecules, Optical lithography, Molecular interactions, Near field scanning optical microscopy, Capillaries

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SPIE Journal Paper | 25 August 2014

Thickness measurements of metal thin films with a plasmonic near-field scanning nanoscope using a resonant ridge aperture

Taekyong Lee, Seonghyeon Oh, Jae Hahn

JNP Vol. 8 Issue 01

KEYWORDS: Metals, Thin films, Gold, Plasmonics, Near field, Near field scanning optical microscopy, Quartz, Atomic force microscopy, Near field optics, Aluminum

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SPIE Journal Paper | 1 June 2012

Experimental analysis of pattern line width in digital maskless lithography

Hoonchul Ryoo, Dong Won Kang, Jae Hahn, Yo-Tak Song

JM3 Vol. 11 Issue 02

KEYWORDS: Photoresist materials, Maskless lithography, Digital micromirror devices, Laser sources, Optical simulations, Optical lithography, Digital imaging, Lithography, Computer aided design, Photomasks

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Proceedings Article | 18 May 2012 Paper

Time-resolved absolute spectral analysis of IR countermeasure flares and its experimental validation by using an optical emission spectrometer with PbSe array detector

Hyungwoo Lee, Changhoon Oh, Jae Hahn

Proc. SPIE. 8374, Next-Generation Spectroscopic Technologies V

KEYWORDS: Infrared sensors, Mid-IR, Sensors, Calibration, Spectroscopy, Infrared spectroscopy, Detector arrays, Black bodies, Infrared signatures, Infrared countermeasures

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Proceedings Article | 21 March 2012 Paper

Design of a high positioning contact probe for plasmonic lithography

Jinhee Jang, Yongwoo Kim, Seok Kim, Howon Jung, Jae Hahn

Proc. SPIE. 8323, Alternative Lithographic Technologies IV

KEYWORDS: Lithography, Plasmonics, Optical lithography, Mechanics, Silicon, Scanning probe lithography, Near field scanning optical microscopy, Finite element methods, Microfabrication, Nanolithography

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Proceedings Article | 21 March 2012 Paper

High-resolution laser direct writing with a plasmonic contact probe

Howon Jung, Yongwoo Kim, Seok Kim, Jinhee Jang, Jae Hahn

Proc. SPIE. 8323, Alternative Lithographic Technologies IV

KEYWORDS: Plasmonics, Diffraction, Optical lithography, Metals, Laser development, Near field scanning optical microscopy, Near field, Raster graphics, Nanolithography, Near field optics

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Proceedings Article | 21 March 2012 Paper

Plasmonic lithography modeling and measurement of near-field distribution of plasmonic nano-aperture

Yongwoo Kim, Seok Kim, Howon Jung, Jinhee Jang, Jae Yong Lee, Jae Hahn

Proc. SPIE. 8323, Alternative Lithographic Technologies IV

KEYWORDS: Lithography, Plasmonics, Finite-difference time-domain method, Nondestructive evaluation, 3D modeling, Photoresist materials, Near field scanning optical microscopy, Near field, Photoresist developing, Process modeling

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In plasmonic nano lithography, a photoresist responds to the localized electric field which decays evanescently in the direction of depth. A simple analytic model is suggested to predict profiles of exposed and finally developed pattern with a finite contrast of photoresist. In this model, the developing process is revisited by accounting the variation of dissolution rate with respect to expose dose distribution. We introduce the concept of nominal developing thickness (NDT) to determine the optimized developing process fitting to the isointensity profile. Based on this model, we obtained three dimensional distribution of near-field of bowtie shaped plasmonic nano aperture in a metal film from the near-field lithography pattern profile. For the near-field exposure, we fabricated a nano aperture in a aluminum metal film which is coated on the contact probe tip. By illuminating 405 nm diode laser source, the positive type photoresist is exposed by the localized electric field produced by nano aperture. The exposed photoresist is developed by the TMAH based solution with a optimum NDT, which leads the developing march encounters the isoexposure contour at threshold dose. From the measurement of developed pattern profile with a atomic force microscope (AFM), the three-dimensional isoexposure (or iso-intensity) surface at the very near region from the exit plane of an aperture (depth: 5 ~ 50 nm) is profiled. Using the threshold dose of photoresist and exposure time, the absolute intensity level is also measured. The experimental results are quantitatively compared with the calculation of FDTD (finite- difference time-domain) method. Concerning with the error in exposure time and threshold dose value, the error in measurement of profile and intensity are less than 6% and 1%, respectively. We expect the lithography model described in this presentation allows more elaborated expectation of developed pattern profile. Furthermore, a methodology of mapping is useful for the quantitative analysis of near-field distribution of nano-scale optical devices.

Proceedings Article | 3 April 2010 Paper

High throughput plasmonic lithography for sub 50nm patterning with a contact probe

Yongwoo Kim, Seok Kim, Howon Jung, Jae Hahn

Proc. SPIE. 7637, Alternative Lithographic Technologies II

KEYWORDS: Lithography, Plasmonics, Optical lithography, Silica, Metals, Glasses, Photoresist materials, Near field, Line width roughness, Aluminum

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Proceedings Article | 4 December 2008 Paper

Calculation of three-dimensional profiles of photoresist exposed by localized electric fields of high-transmission metal nano-apertures

Eungman Lee, Jae Won Hahn

Proc. SPIE. 7140, Lithography Asia 2008

KEYWORDS: Lithography, Plasmonics, Surface plasmon polaritons, Finite-difference time-domain method, Optical lithography, Visualization, Metals, 3D modeling, Photoresist materials, Aluminum

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Proceedings Article | 21 March 2008 Paper

Nano patterning with a single high-transmission nano-metal aperture system

Yongwoo Kim, Sinjeung Park, Eungman Lee, Jae Hahn

Proc. SPIE. 6921, Emerging Lithographic Technologies XII

KEYWORDS: Lithography, Microscopes, Light sources, Optical lithography, Metals, Near field, Solids, Objectives, Aluminum, Near field optics

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Proceedings Article | 14 February 2008 Paper

Uncertainty analysis on optical testing with a Shack-Hartmann sensor and a point source

Dong Won Kang, Jin Seok Lee, Ho-Soon Yang, Jae Won Hahn

Proc. SPIE. 6884, Reliability, Packaging, Testing, and Characterization of MEMS/MOEMS VII

KEYWORDS: Microlens array, Sensors, Calibration, Wavefront sensors, Wavefronts, Optical testing, Relays, Charge-coupled devices, Digital video discs, Spherical lenses

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Proceedings Article | 14 February 2008 Paper

Temporal and spectral analysis of laser induced plasma in the ablation process of flexible printed circuit board

Hoon Ryoo, Seok Kim, Jae Hahn

Proc. SPIE. 6879, Photon Processing in Microelectronics and Photonics VII

KEYWORDS: Signal to noise ratio, Polymers, Copper, Laser processing, Laser ablation, Laser induced breakdown spectroscopy, Plasma generation, Pulsed laser operation, Flex printed circuits, Plasma

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Proceedings Article | 21 March 2007 Paper

Spectrally investigated optimization for high optical transmission of the C-shaped nano apertures

Eungman Lee, Kyoungsik Kim, Jae W. Hahn

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Finite-difference time-domain method, Optical lithography, Metals, Silver, Laser applications, Near field, Transmittance, Aluminum, Light wave propagation, Near field optics

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Proceedings Article | 15 March 2007 Paper

Design of metal slits for higher harmonic fringe patterns generated with surface plasmon interference lithography

Yunmi Lee, Sinjeung Park, Eungman Lee, Kyoungsik Kim, Jae Hahn

Proc. SPIE. 6517, Emerging Lithographic Technologies XI

KEYWORDS: Lithography, Fringe analysis, Surface plasmons, Finite-difference time-domain method, Polymethylmethacrylate, Metals, Photoresist materials, Photomasks, Aluminum, Light wave propagation

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Proceedings Article | 4 October 2001 Paper

Inspection system for microelectronics BGA package using wavelength scanning interferometry

Chul-moo Kang, Hyun Woo, Hyungsuck Cho, Jae Han, Jae-Yong Lee

Proc. SPIE. 4564, Optomechatronic Systems II

KEYWORDS: Mirrors, Tunable lasers, Interferometers, Inspection, Fourier transforms, Interferometry, Optical testing, CCD cameras, 3D metrology, Charge-coupled devices

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Inspection and shape measurement of three-dimensional objects are widely needed in industries for quality monitoring and control. A number of visual or optical technologies have been successfully applied to measure three dimensional surfaces. Especially, the shape measurement using an interferometric principle becomes a successful methodology. However, those conventional interferometric methods to measure surface profile have an inherent shortcoming, namely 2π ambiguity problem. The problem inevitably happens when the object to be measured has discontinuous shape due to the repetition of interferometric signal with phase period of 2π . Therefore, in this paper, we choose as a shape measuring method Wavelength Shifting Interferometer (WSI) in which the absolute distance from the reference surface can be directly obtained from the amount of interferometric phase change. With the above advantage the coplanarity of ball grid array (BGA) can be easily evaluated and inspected, which is the major factor in the BGA surface mounting technology. The WSI is basically composed of a Twyman Green Interferometry and a tunable laser source. The proposed WSI so far by other researchers suffer from low measurement resolution because of the methodological roughness in obtaining interferometric phase change. Therefore, we propose a new algorithm, which can obtain a small amount of even fractional phase change by sinusoidal function fitting. To evaluate the effectiveness of the proposed sinusoidal function fitting algorithm, a series of measurements is conducted for discontinuously shaped specimens which have various heights. The proposed algorithm shows much more enhanced measurement resolution than other existing conventional algorithms such as zero crossing algorithm and Fourier transform algorithm. To measure the three dimensional shape of ball grid array with WSI, a series of simulations was performed for a hemispherical ball model in which the diffuse surface conditions are considered. The simulation results show that the three dimensional shape of a ball can be measured using WSI for purpose of BGA product inspections.

Proceedings Article | 4 December 1998 Paper

New design of four-pass dye laser amplifier and suppression of amplified spontaneous emission

Jae Hahn, Yong Yoo, Eun Lee

Proc. SPIE. 3491, 1998 International Conference on Applications of Photonic Technology III: Closing the Gap between Theory, Development, and Applications

KEYWORDS: Continuous wave operation, Optical amplifiers, Dye lasers, Amplifiers, Oxygen, Raman spectroscopy, Pulsed laser operation, Laser systems engineering, Diffraction gratings

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