Dr. Jaewoong Sohn Profile

Dr. Jaewoong Sohn

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (25)

Proceedings Article | 28 April 2023 Paper

Paper

Improvement of CD uniformity using a new selective exposure focusing method

Seonho Lee, Jaewoong Sohn, Hyosung Lee, Jaehyung Jung, Youngjun Kim, Heehong Lee, HyoungHwa Jin, Harim Oh, Yongchan Kim, Maarten Boogaarts, Nataliya Nishchenko, Jin-Sung Kim, Noh-Kyoung Park, Sang-Jin Kim, Javier Loaiza Rivas, Jens Wustenfeld, Martin de Nivelle, Valerio Altini

Proceedings Volume 12494, 124940Y (2023) https://doi.org/10.1117/12.2657203

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Sensors, Scanners, High volume manufacturing, Lithography, Optical lithography, Distributed interactive simulations, Device simulation, Process control

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Proceedings Article | 27 April 2023 Presentation + Paper

Presentation + Paper

Quantifying CD-SEM contact hole roughness and shape combined with machine learning-based pattern fidelity scores for process optimization and monitoring

Hyosung Lee, Seonho Lee, Hyungju Rah, Iksun Park, Jaeil Lee, Jaewoong Sohn, Yongchan Kim, Christoph Ehrlich, Philip Groeger, Sven Boese, Enrico Bellmann, Stefan Buhl, Seop Kim, Kang-san Lee

Proceedings Volume 12496, 124961P (2023) https://doi.org/10.1117/12.2657679

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Scanning electron microscopy, Image processing, Image restoration, Education and training, Contour extraction, Machine learning, Deformation, Finite element methods

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Proceedings Article | 27 April 2023 Poster + Paper

Poster + Paper

Absolute alignment measurement of underlayer and overlayer of diffraction-based overlay mark by image-based alignment metrology system

Jaeil Lee, Iksun Park, Youngjin Park, Jonghyun Hwang, Hyeonjun Ha, Jaewoong Sohn, Jaehee Lee, Jinseok Moon, Yuki Kondo, Satoshi Ando

Proceedings Volume 12496, 124962F (2023) https://doi.org/10.1117/12.2657656

KEYWORDS: Overlay metrology, Optical alignment, Metrology

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Proceedings Article | 26 May 2022 Presentation + Paper

Presentation + Paper

Improvement of local CDU by using low speckle imaging

Hyounghwa Jin, Yongwoo Kim, Harim Oh, Jaehyung Jung, Jaewoong Sohn, Woosung Jin, Kangyeol Yun, Hyosung Lee

Proceedings Volume 12051, 1205107 (2022) https://doi.org/10.1117/12.2615747

KEYWORDS: Speckle, Semiconducting wafers, Speckle pattern, Speckle imaging, Line width roughness, Pulsed laser operation, Photoresist materials, Stochastic processes, Scanners, Optical lithography

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Proceedings Article | 17 April 2014 Paper

Paper

Resist outgassing contamination on EUV multilayer mirror analogues

Diego Alvarado, Yudhishthir Kandel, Jaewoong Sohn, Tonmoy Chakraborty, Dominic Ashworth, Gregory Denbeaux

Proceedings Volume 9048, 90481A (2014) https://doi.org/10.1117/12.2046613

KEYWORDS: Contamination, Hydrogen, Extreme ultraviolet lithography, Photoresist materials, Ruthenium, Semiconducting wafers, Extreme ultraviolet, Sulfur, Mirrors, Photoresist processing

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Proceedings Article | 1 April 2013 Paper

Paper

Resist outgassing contamination growth results using both photon and electron exposures

Gregory Denbeaux, Yudhishthir Kandel, Genevieve Kane, Diego Alvardo, Mihir Upadhyaya, Yashdeep Khopkar, Alexander Friz, Karen Petrillo, Jaewoong Sohn, Chandra Sarma, Dominic Ashworth

Proceedings Volume 8679, 86790L (2013) https://doi.org/10.1117/12.2011606

KEYWORDS: Contamination, Extreme ultraviolet lithography, Semiconducting wafers, Photoresist materials, Hydrogen, Scanners, Molecules, Plasma, Wafer-level optics, Electron beams

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Proceedings Article | 23 March 2012 Paper

Paper

Ion beam deposition system for depositing low defect density extreme ultraviolet mask blanks

V. Jindal, P. Kearney, J. Sohn, J. Harris-Jones, A. John, M. Godwin, A. Antohe, R. Teki, A. Ma, F. Goodwin, A. Weaver, P. Teora

Proceedings Volume 8322, 83221W (2012) https://doi.org/10.1117/12.916580

KEYWORDS: Extreme ultraviolet, Photomasks, Ions, Extreme ultraviolet lithography, Ion beams, Particles, Silicon, Molybdenum, Ruthenium, Chemical species

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Proceedings Article | 20 March 2010 Paper

Paper

A study of reticle non-flatness induced image placement error contributions in EUV lithography

Sudhar Raghunathan, Obert Wood, Pradeep Vukkadala, Roxann Engelstad, Brian Lee, Sander Bouten, Thomas Laursen, John Zimmerman, Jaewoong Sohn, John Hartley

Proceedings Volume 7636, 76360W (2010) https://doi.org/10.1117/12.847107

KEYWORDS: Reticles, Extreme ultraviolet, Semiconducting wafers, Finite element methods, Extreme ultraviolet lithography, Particles, Electrodes, Distortion, Data modeling, Printing

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Proceedings Article | 30 September 2009 Paper

Paper

Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography

Sudhar Raghunathan, Adam Munder, John Hartley, Jaewoong Sohn, Kevin Orvek

Proceedings Volume 7488, 748816 (2009) https://doi.org/10.1117/12.834746

KEYWORDS: Reticles, Extreme ultraviolet, Extreme ultraviolet lithography, Overlay metrology, Error analysis, Scanners, Semiconducting wafers, Distortion, Photomasks, Wafer-level optics

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Proceedings Article | 11 May 2009 Paper

Paper

Evaluation of an e-beam correction strategy for compensation of EUVL mask non-flatness

Kevin Orvek, Jaewoong Sohn, Jin Choi, Roxann Engelstad, Sudharshanan Raghunathan, John Zimmerman, Thomas Laursen, Yoshitake Shusuke, Tsutomu Shoki

Proceedings Volume 7379, 73790Q (2009) https://doi.org/10.1117/12.824267

KEYWORDS: Photomasks, Scanners, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Extreme ultraviolet, Polishing, Distortion, Overlay metrology, Optical alignment

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Proceedings Article | 18 March 2009 Paper

Paper

Protection efficiency of a standard compliant EUV reticle handling solution

Long He, John Lystad, Stefan Wurm, Kevin Orvek, Jaewoong Sohn, Andy Ma, Patrick Kearney, Steve Kolbow, David Halbmaier

Proceedings Volume 7271, 72710I (2009) https://doi.org/10.1117/12.814304

KEYWORDS: Reticles, Extreme ultraviolet, Inspection, Photomasks, Particles, Extreme ultraviolet lithography, Silica, Semiconducting wafers, Standards development, Contamination

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Proceedings Article | 2 May 2008 Paper

Paper

Status of EUVL reticle chucking

Roxann Engelstad, Jaewoong Sohn, Jacob Zeuske, Venkata Siva Battula, Pradeep Vukkadala, Chris Van Peski, Kevin Orvek, Kevin Turner, Andrew Mikkelson, Madhura Nataraju

Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

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Proceedings Article | 16 November 2007 Paper

Paper

Techniques to measure force uniformity of electrostatic chucks for EUV mask clamping

Sathish Veeraraghavan, Jaewoong Sohn, Kevin Turner

Proceedings Volume 6730, 67305G (2007) https://doi.org/10.1117/12.746843

KEYWORDS: Semiconducting wafers, Photomasks, 3D modeling, Extreme ultraviolet lithography, Distortion, Finite element methods, Dielectrics, Silicon, Particles, Interfaces

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Proceedings Article | 30 October 2007 Paper

Paper

Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Roxann Engelstad, Kevin Turner, Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Venkata Siva Battula, Pradeep Vukkadala, Jacob Zeuske, Chris Van Peski

Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842

KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

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Proceedings Article | 24 October 2007 Paper

Paper

Compensating for image placement errors induced during the fabrication and chucking of EUVL masks

Roxann Engelstad, Jaewoong Sohn, Andrew Mikkelson, Madhura Nataraju, Kevin Turner

Proceedings Volume 6730, 673004 (2007) https://doi.org/10.1117/12.752601

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Distortion, Electron beam lithography, 3D modeling, Etching, Interferometry, Surface finishing, Thin films

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Proceedings Article | 3 May 2007 Paper

Paper

Predicting and correcting for image placement errors during the fabrication of EUVL masks

R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner

Proceedings Volume 6533, 653314 (2007) https://doi.org/10.1117/12.737181

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Distortion, Reticles, 3D modeling, Etching, Electron beam lithography, Surface finishing, Thin films, Multilayers

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Proceedings Article | 15 March 2007 Paper

Paper

Electrostatic chucking of EUVL reticles

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Roxann Engelstad, Kevin Turner, Chris Van Peski, Kevin Orvek

Proceedings Volume 6517, 65170Y (2007) https://doi.org/10.1117/12.720621

KEYWORDS: Reticles, Extreme ultraviolet lithography, Standards development, Photomasks, Interferometers, Photography, Dielectrics, Finite element methods, Coating, Interferometry

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Proceedings Article | 20 October 2006 Paper

Paper

Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 634939 (2006) https://doi.org/10.1117/12.686153

KEYWORDS: Reticles, Data modeling, Photomasks, Extreme ultraviolet lithography, Interferometers, Standards development, Finite element methods, Photography, Vibration isolation, Particles

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Proceedings Article | 20 October 2006 Paper

Paper

Measuring force uniformity in electrostatic chucking of EUVL masks

Jaewoong Sohn, Sathish Veerarghavan, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 63493B (2006) https://doi.org/10.1117/12.686282

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Photomasks, Particles, Analytical research, Dielectrics, Interferometry, Data modeling, Finite element methods, Fourier transforms

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Proceedings Article | 21 June 2006 Paper

Paper

Characterizing the response of an EUV reticle during electrostatic chucking

Roxann Engelstad, Edward Lovell, Andrew Mikkelson, Madhura Nataraju, Vasu Ramaswamy, Jaewoong Sohn, Gerald Dicks, Amr Abdo, Richard Tejeda

Proceedings Volume 6281, 628107 (2006) https://doi.org/10.1117/12.692727

KEYWORDS: Reticles, Particles, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Data modeling, Zerodur, Glasses, 3D modeling, Thermal modeling

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Proceedings Article | 22 March 2006 Paper

Paper

EUV mask and chuck analysis: simulation and experimentation

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6151, 61510C (2006) https://doi.org/10.1117/12.657154

KEYWORDS: Photomasks, Extreme ultraviolet, Data modeling, Focus stacking software, Lithography, Semiconductors, Extreme ultraviolet lithography, Standards development, Interferometers, Contamination

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Proceedings Article | 8 November 2005 Paper

Paper

Electrostatic chucking and EUVL mask flatness analysis

M. Nataraju, A. Mikkelson, J. Sohn, R. Engelstad, E. Lovell

Proceedings Volume 5992, 59923S (2005) https://doi.org/10.1117/12.631361

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Data modeling, Standards development, Image quality, Control systems, Error analysis, Analytical research, Lithography

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Proceedings Article | 20 May 2004 Paper

Paper

Modeling LEEPL mask fabrication processes

Xabier Azkorra, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Jaehyuk Chang, Jaewoong Sohn, Madhura Nataraju, Hideyuki Eguchi

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546927

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electrodes, Mask making, Silicon, 3D modeling, Printing, Lithography, Device simulation

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Proceedings Article | 16 June 2003 Paper

Paper

EUV mask stress mapping by an experimental and hybrid finite element technique

Zhaohua Feng, Edward Lovell, Roxann Engelstad, Andrew Mikkelson, Phillip Reu, Jaewoong Sohn, Kenneth Blaedel, Andre Claudet

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.490139

KEYWORDS: Photomasks, Extreme ultraviolet, Multilayers, Reticles, Reflectors, Lithography, Distortion, Extreme ultraviolet lithography, Chromium, Spherical lenses

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Proceedings Article | 11 March 2002 Paper

Paper

Mask-related distortions of modified fused silica reticles for 157-nm lithography

Andrew Mikkelson, Amr Abdo, Eric Cotte, Jaewoong Sohn, Roxann Engelstad, Edward Lovell

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458256

KEYWORDS: Reticles, Pellicles, Electron beam lithography, Photomasks, Silica, Lithography, Device simulation, 3D modeling, Chromium, Mechanics

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Showing 5 of 25 publications

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