Dr. Joshua Jeong Profile

Dr. Joshua Jeong

at Siemens EDA

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Publications (1)

Proceedings Article | 4 April 2011 Paper

Lithography aware design optimization using ILT

Jaeyoon Jeong, Seokyun Jeong, Changhoon Ahn, Yongsun Jang, Sukjoo Lee, Thomas Cecil, Donghwan Son, Tatung Chow, David Kim

Proceedings Volume 7974, 797409 (2011) https://doi.org/10.1117/12.879393

KEYWORDS: Photomasks, Lithography, Optical proximity correction, Source mask optimization, Photovoltaics, Optical lithography, Optimization (mathematics), Detection and tracking algorithms, Electroluminescence, Semiconducting wafers

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