Prof. Jaisoon Kim Profile

Prof. Jaisoon Kim

Technical Advisor at Myongji Univ

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Author

Publications (21)

Proceedings Article | 26 March 2019 Paper

Study on a feasibility of dark-field illumination for the near-field microscope

Hangyeong Oh, Woojun Han, Yungi Lee, Jaisoon Kim

Proceedings Volume 10959, 109592I (2019) https://doi.org/10.1117/12.2514442

KEYWORDS: Imaging systems, Near field, Manufacturing, Image resolution, Objectives, Inspection, Sensors, Light emitting diodes, Microscopes, Titanium

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SPIE Journal Paper | 24 September 2018 Open Access

Moiré effect in displays: a tutorial (Erratum)

Vladimir Saveljev, Sung-Kyu Kim, Jaisoon Kim

OE, Vol. 57, Issue 09, 099801, (September 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.9.099801

KEYWORDS: Physics, Optical engineering

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SPIE Journal Paper | 28 March 2018 Open Access

Moiré effect in displays: a tutorial

Vladimir Saveljev, Sung-Kyu Kim, Jaisoon Kim

OE, Vol. 57, Issue 03, 030803, (March 2018) https://doi.org/10.1117/12.10.1117/1.OE.57.3.030803

KEYWORDS: Visualization, Optical engineering, 3D displays, Visibility, Cameras, Photography, Visible radiation, LCDs, Image quality, Distance measurement

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Proceedings Article | 13 March 2018 Paper

Study on the dark-field illumination for near-field microscope using anamorphic optics to inspect defects on semiconductor wafers

Woojun Han, Sunseok Yang, Hangyeong Oh, Yoongi Lee, Jaisoon Kim

Proceedings Volume 10585, 1058520 (2018) https://doi.org/10.1117/12.2297506

KEYWORDS: Near field, Imaging systems, Inspection, Objectives, Near field optics, Optical inspection, Light emitting diodes, Microscopes, Wafer-level optics, Semiconducting wafers

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Proceedings Article | 28 March 2017 Presentation + Paper

Anamorphic approach for developing hi-efficiency illumination system to inspect defects on semiconductor wafers

Woojun Han, Sunseok Yang, Ohhyung Kwon, Seungyong Chu, Seungchul Oh, Woosung Jung, Jaisoon Kim

Proceedings Volume 10145, 1014517 (2017) https://doi.org/10.1117/12.2258162

KEYWORDS: Inspection, Near field optics, Light sources, Defect inspection, Beam shaping, Semiconducting wafers, Near field, Lithium, Ultraviolet radiation, Prisms, Optical inspection, Optical design, Light emitting diodes

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Proceedings Article | 2 April 2014 Paper

Development of UV inspection system on the defect of electrode for 5um level multilayer pattern

Kee Namgung, Jihun Woo, Sanghee Lim, Seonho Lee, Jisoo Lee, Seung il Lim, Jaewon Lim, Byongkyeom Kim, Jaisoon Kim

Proceedings Volume 9050, 90502S (2014) https://doi.org/10.1117/12.2046621

KEYWORDS: Inspection, Electrodes, Ultraviolet radiation, Image processing, Organic light emitting diodes, Objectives, Imaging systems, Visible radiation, Multilayers, Glasses

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In General, OLED, LCD, TSP Glass TFT Pattern consists of multi-layer of electrodes separated by a thin insulating film and layers are very close to each other. The inspection of electrode pattern and defect in multilayered devices by using visible light (550nm around) image is too much difficult to define its critical shape among layers, because of deep depth range in conventional optics of moderate numerical aperture (NA). To increase image contrast between materials and layers, this study uses UV wavelength that has larger selective differences of reflectance than visible light. Newly developed optical system and image analysis units are focused to the proper inspection wavelength at the specific UV range to clearly define a top electrode layer and reduce image processing time. To detect defects on the electrode, the resolution of the optical system should be much higher than the spatial frequency of the electrode size. After considering system requirements, two types of different magnification systems (1.2X and 3X) are developed. Direct side illumination is available in 1.2X system which has large back focal length, however, 3X system needs on axis illumination. Line beam illumination from the multi-point LED source (custom made) is used to increase the light efficiency and decrease noise⁽⁴⁾. Illumination beam passing through the common objective lens (in front of imaging optics) and illumination optics (including cylinder lens) can realized uniform intensity of one dimensional Fourier plane on the surface of target electrode. Electric units for high speed data processing and transfer and image processing algorithm are also developed. For processing large capacity image data (8 GB) synchronized with moving sensors in real time, embedded system with hardware optimizing design and FPGA module camera are adopted. Final image shows good selective contrast and resolution between layers even in the high depth condition followed by required NA for the target resolution. This inspection system can be used in inspection of PCB Pattern, LCD, OLED and Mobile Glass including many other film and glass.

SPIE Journal Paper | 1 February 2011

Twin-image elimination using quadrantal masks in a digital holographic microscope

Moonseok Kim, Sukjoon Hong, Seongbo Shim, Kwangsup Soh, Younghun Yu, Sanghoon Shin, Jaewan Kim, Jaisoon Kim

OE, Vol. 50, Issue 02, 025801, (February 2011) https://doi.org/10.1117/12.10.1117/1.3537970

KEYWORDS: Charge-coupled devices, Molybdenum, Digital holography, Holography, Holograms, Microscopes, 3D image reconstruction, 3D metrology, Optical engineering, 3D image processing

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Proceedings Article | 3 June 2010 Paper

Characteristics of the depth of focus in a high-NA optical system with a SIAX for data storage

Jaisoon Kim, Moonseok Kim, Sukjoon Hong, Tom Milster

Proceedings Volume 7730, 77300M (2010) https://doi.org/10.1117/12.859234

KEYWORDS: Axicons, Tolerancing, Fluctuations and noise, Data storage, Wavefronts, Distortion, Diffraction, Bessel beams, Optical storage, Beam propagation method

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Proceedings Article | 5 May 2010 Paper

Wavefront error analysis and compensation in a digital holographic microscope

Moonseok Kim, Sukjoon Hong, Kwangsup Soh, Sanghoon Shin, Jung-Young Son, Jaesung Lee, Jaisoon Kim

Proceedings Volume 7690, 76900G (2010) https://doi.org/10.1117/12.850244

KEYWORDS: Digital holography, Wavefronts, Molybdenum, Computer generated holography, Super resolution, Holography, Microscopes, Phase measurement, Wavefront compensation, Point spread functions

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SPIE Journal Paper | 1 May 2010

Plane wave illumination for correct phase analysis and alternative phase unwrapping in dual-type (transmission and reflection) three-dimensional digital holographic microscopy

Moonseok Kim, Sukjoon Hong, Seongbo Shim, Kwangsup Soh, Sanghoon Shin, Jung-Young Son, Jaesung Lee, Jaisoon Kim

OE, Vol. 49, Issue 05, 055801, (May 2010) https://doi.org/10.1117/12.10.1117/1.3430627

KEYWORDS: Reflection, Molybdenum, Digital holography, Phase measurement, Wavefronts, Holography, Charge-coupled devices, 3D image reconstruction, Relays, Illumination engineering

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Proceedings Article | 31 July 2009 Paper

Study on the scanning system for deep focused beam by Axicon

Sukjoon Hong, Junyeob Yeo, Tom Milster, Jaisoon Kim

Proceedings Volume 7505, 750514 (2009) https://doi.org/10.1117/12.838511

KEYWORDS: Axicons, Mirrors, Imaging systems, Bessel beams, Lens design, Optical design, Modulation transfer functions, Beam propagation method, Data storage, Laser optics

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Proceedings Article | 7 May 2009 Paper

Study on elimination of twin image in a combined dual-type digital hologram microscope system

Moonseok Kim, Sukjoon Hong, Kwangdong Roh, Kwangsup Soh, Sanghoon Shin, Jung-Young Son, Jaisoon Kim

Proceedings Volume 7329, 73290F (2009) https://doi.org/10.1117/12.820167

KEYWORDS: Digital holography, Molybdenum, Holograms, Holography, Imaging systems, Microscopes, 3D image reconstruction, Reflection, Digital imaging, Relays

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Proceedings Article | 16 March 2009 Paper

32 nm half pitch formation with high numerical aperture single exposure

Minhee Jung, Joon-Min Park, Moonseok Kim, Sukjoon Hong, Jaisoon Kim, In-Ho Park, Hye-Keun Oh

Proceedings Volume 7274, 72741Z (2009) https://doi.org/10.1117/12.814103

KEYWORDS: Nanoimprint lithography, Lithography, Double patterning technology, Critical dimension metrology, Immersion lithography, Microfluidics, Optical lithography, Binary data, Physics, Ultraviolet radiation

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Proceedings Article | 25 March 2008 Paper

22 nm node contact hole formation in extreme ultra-violet lithography

Eun-Jin Kim, Kwan-Hyung Kim, Hyeong-Ryeol Park, Jun-Yeob Yeo, Jai-Soon Kim, Hye-Keun Oh

Proceedings Volume 6922, 69223X (2008) https://doi.org/10.1117/12.780242

KEYWORDS: Optical lithography, Extreme ultraviolet lithography, Photomasks, Lithography, Ultraviolet radiation, Image processing, Extreme ultraviolet, Refractive index, Silicon, Critical dimension metrology

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Proceedings Article | 14 May 2007 Paper

Process latitude dependency on local photomask haze defect in 70-nm binary intensity mask

Young-Min Kang, Sung-Jin Kim, Jin-Back Park, Wook Chang, Seung-Wook Park, Jai-Soon Kim, Han-Koo Cho, Hye-Keun Oh

Proceedings Volume 6607, 660720 (2007) https://doi.org/10.1117/12.728983

KEYWORDS: Air contamination, Photomasks, Phase shifts, Electroluminescence, Binary data, Reticles, Semiconducting wafers, Critical dimension metrology, Semiconductors, Crystals

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Proceedings Article | 21 March 2007 Paper

Characteristics and prevention of pattern collapse in EUV lithography

Wook Chang, Eun-Jin Kim, Young-Min Kang, Seung-Wook Park, Chang-Moon Lim, Ki-Tak Won, Jai-Soon Kim, Hye-Keun Oh

Proceedings Volume 6517, 65172S (2007) https://doi.org/10.1117/12.712469

KEYWORDS: Extreme ultraviolet, Deep ultraviolet, Extreme ultraviolet lithography, Lithography, Liquids, Semiconductors, Ultraviolet radiation, Adhesives, Optical lithography, Autoregressive models

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Proceedings Article | 21 March 2007 Paper

Photoresist adhesion effect of resist reflow process

Joon-Min Park, Ji-Eun Lee, Moon-Seok Kim, Jung-Hun Kim, Jai-Soon Kim, Sung-Muk Lee, Jun-Tack Park, Chul-Kyu Bok, Seung-Chan Moon, Seung-Wook Park, Joo-Yoo Hong, Hye-Keun Oh

Proceedings Volume 6519, 65193O (2007) https://doi.org/10.1117/12.712498

KEYWORDS: Photoresist processing, Photoresist materials, Semiconductors, Glasses, Thin films, Lithography, Physics, Chemistry, Computer simulations, Applied physics

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Proceedings Article | 21 March 2006 Paper

Evaluation of partial coherent imaging using the transfer function in immersion lithography

Mi-Rim Jung, Eun-A Kwak, Hye-Keun Oh, Seong-Bo Shim, Na-Rak Choi, Jai-Soon Kim

Proceedings Volume 6154, 61542R (2006) https://doi.org/10.1117/12.656983

KEYWORDS: Polarization, Immersion lithography, Resolution enhancement technologies, Refractive index, Photomasks, Modulation transfer functions, Lithographic illumination, Image quality, Coherence imaging, Liquids

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Proceedings Article | 28 May 2004 Paper

Simple 157-nm interference illumination system for pattern formation

Seung-Wook Park, Jang-hwan Jeong, Jung-wook Choi, Hye-keun Oh, Jaesoon Kim, Inho Park

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536180

KEYWORDS: Mirrors, Excimer lasers, Lithography, Semiconductors, Semiconducting wafers, Lithographic illumination, Absorption, Polymethylmethacrylate, Photoresist processing, Imaging systems

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Proceedings Article | 12 June 2003 Paper

A simple optical system parameter optimization method by comparing the critical dimension

Mi-Ae Ha, Dong-Soo Sohn, Kyoung-Ah Jun, Ji-Yong Yoo, Hye-Keun Oh, Jaesoon Kim, In-Ho Park

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485070

KEYWORDS: Monte Carlo methods, Photomasks, Critical dimension metrology, Semiconducting wafers, Image processing, Data modeling, Photoresist processing, Cadmium, Lithographic illumination, Optical lithography

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Proceedings Article | 10 January 2002 Paper

Design aspects of waveguide hybrid advance MEMS (WHAM)

Jaisoon Kim, Tomas Milster

Proceedings Volume 4342, (2002) https://doi.org/10.1117/12.453420

KEYWORDS: Tolerancing, Waveguides, Lens design, Objectives, Diffraction, Prototyping, Microelectromechanical systems, Collimators, Control systems, Optics manufacturing

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Showing 5 of 21 publications

Conference Committee Involvement (5)

Optical Design and Testing XII

5 December 2022 | Online Only, China

Optical Design and Testing XI

10 October 2021 | Nantong, JS, China

Optical Design and Testing X

12 October 2020 | Online Only, China

Optical Design and Testing IX

21 October 2019 | Hangzhou, China

Optical Design and Testing VIII

11 October 2018 | Beijing, China

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