Dr. James Beach
Senior Member/Technical Staff at SEMATECH Inc
SPIE Involvement:
Author | Instructor
Publications (9)

Proceedings Article | 5 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Lithography, Metrology, Calibration, Scanners, Scanning electron microscopy, Photoresist materials, Process control, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 12 May 2005 Paper
Proc. SPIE. 5754, Optical Microlithography XVIII
KEYWORDS: Lithography, Reticles, Etching, Quartz, Manufacturing, Photomasks, Nanoimprint lithography, Critical dimension metrology, Vestigial sideband modulation, Phase shifts

Proceedings Article | 26 June 2003 Paper
Proc. SPIE. 5040, Optical Microlithography XVI
KEYWORDS: Lithography, Lithographic illumination, Quartz, Scanners, Photomasks, Optical proximity correction, Semiconducting wafers, Overlay metrology, Phase shifts, Fiber optic illuminators

Proceedings Article | 27 December 2002 Paper
Proc. SPIE. 4889, 22nd Annual BACUS Symposium on Photomask Technology
KEYWORDS: Lithography, Image processing, Scanners, Manufacturing, Electroluminescence, Printing, Photomasks, Phase measurement, Overlay metrology, Phase shifts

Proceedings Article | 12 July 2002 Paper
Proc. SPIE. 4692, Design, Process Integration, and Characterization for Microelectronics
KEYWORDS: Lithography, Diffraction, Optical lithography, Lithographic illumination, Imaging systems, Photomasks, Transistors, Nanoimprint lithography, Phase shifts, Fiber optic illuminators

Showing 5 of 9 publications
Course Instructor
SC679: Introduction to Microlithography: Theory, Resolution Enhancement and Future Trends
This course covers the optics of exposure tools, the chemistry of resists, and the effects of processing variables and different exposure techniques on the final relief image. Microlithography is traced from its origins to modern day, to its likely future with emphasis placed on optical extension. Different resolution enhancement techniques are described such as off-axis illumination and the use of various phase-shift masks. The chemistry of resists are detailed and are related back to their responses to different processing parameters/behaviors. Non-conventional resist processing (now starting to receive acceptance) is also described. Finally, emerging lithography technologies are discussed to outline the likely future directions of the industry.
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