Mr. James Hamzik Profile

James Hamzik

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Publications (5)

Proceedings Article | 25 May 2022 Poster + Paper

Removing metallic contaminants from photochemical solvents using advanced purification technologies

Kusum Maharjan, Iou-Sheng Ke, Sabrina Wong, Aiwen Wu, Ying Qi, James Hamzik, Lawrence Chen

Proceedings Volume 12055, 120550V (2022) https://doi.org/10.1117/12.2614308

KEYWORDS: Metals, Iron, Optical lithography, Zinc, Calcium, Sodium, Aluminum, Magnesium, Copper

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Proceedings Article | 23 March 2020 Presentation + Paper

Addressing metallic contaminants in the photochemical supply chain

Jad Jaber, James Hamzik, Nicholas Filipancic, Justin Brewster, Annie Xia

Proceedings Volume 11326, 1132613 (2020) https://doi.org/10.1117/12.2551646

KEYWORDS: Metals, Surface plasmons, Contamination, Ions, Molecules, Polymers, Photons, Semiconducting wafers, Photoresist materials, Silicon

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Proceedings Article | 13 March 2018 Paper

Targeted removal of metallic contamination from lithography solvents using membrane purifiers

Aiwen Wu, Tetsu Kohyama, James Hamzik, Saksatha Ly, Jad Jaber

Proceedings Volume 10586, 1058618 (2018) https://doi.org/10.1117/12.2297395

KEYWORDS: Metals, Ions, Lithography, Contamination, Adsorption, Photoresist materials, Semiconducting wafers

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Proceedings Article | 27 March 2017 Paper

Development of novel purifiers with appropriate functional groups based on solvent polarities at bulk filtration

Tetsu Kohyama, Fumiya Kaneko, Saksatha Ly, James Hamzik, Jad Jaber, Yoshiaki Yamada

Proceedings Volume 10146, 101461J (2017) https://doi.org/10.1117/12.2257388

KEYWORDS: Metals, Polymers, Manufacturing, Contamination, Process control, Surface plasmons, Lithography, Potassium, Chemical reactions, Iron, Adsorption

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Proceedings Article | 27 March 2017 Paper

Continuous improvements of defectivity rates in immersion photolithography via functionalized membranes in point-of-use photochemical filtration

Lucia D'Urzo, Hareen Bayana, Jelle Vandereyken, Philippe Foubert, Aiwen Wu, Jad Jaber, James Hamzik

Proceedings Volume 10146, 101462A (2017) https://doi.org/10.1117/12.2258582

KEYWORDS: Lithography, Photoresist materials, Immersion lithography, Semiconducting wafers, Line width roughness, Line edge roughness, Scanning electron microscopy, Particles, Bridges, Finite element methods, Fermium, Frequency modulation

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