Mr. James R. Manka Profile

James R. Manka

Application Development Engineer at KLA Corp

SPIE Involvement:

Author

Area of Expertise:

microlithography , overlay metrology , general applications engineering

Publications (8)

Proceedings Article | 24 March 2016 Paper

Accuracy in optical overlay metrology

Barak Bringoltz, Tal Marciano, Tal Yaziv, Yaron DeLeeuw, Dana Klein, Yoel Feler, Ido Adam, Evgeni Gurevich, Noga Sella, Ze'ev Lindenfeld, Tom Leviant, Lilach Saltoun, Eltsafon Ashwal, Dror Alumot, Yuval Lamhot, Xindong Gao, James Manka, Bryan Chen, Mark Wagner

Proceedings Volume 9778, 97781H (2016) https://doi.org/10.1117/12.2219176

KEYWORDS: Overlay metrology, Scatterometry, Process control, Optical metrology, Metrology, Image processing, Optics manufacturing, Semiconductor manufacturing, Semiconductors, Manufacturing, Accuracy assessment, Optical alignment, Signal processing, Semiconducting wafers, Diffraction, Neodymium, Physics

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Proceedings Article | 5 April 2012 Paper

Toward faster and better litho control in high-volume manufacturing

Chui-Fu Chiu, Chun-Yen Huang, Wen-Bin Wu, Chiang-Lin Shih, Healthy Huang, James Manka, DongSub Choi, Arthur Lin, David Tien

Proceedings Volume 8324, 832426 (2012) https://doi.org/10.1117/12.916409

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Image segmentation, Metrology, Control systems, Lithography, Calibration, High volume manufacturing, Critical dimension metrology

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Proceedings Article | 24 March 2009 Paper

The study and simulation of high-order overlay control including field-by-field methodologies

Dongsub Choi, Chulseung Lee, Changjin Bang, Myoungsoo Kim, Hyosang Kang, James Manka, Seunghoon Yoon, Dohwa Lee, John Robinson

Proceedings Volume 7272, 727230 (2009) https://doi.org/10.1117/12.812935

KEYWORDS: Scanners, Semiconducting wafers, Overlay metrology, Data modeling, Semiconductors, Optical lithography, Optical alignment, Lithium, Control systems, Semiconductor manufacturing

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Proceedings Article | 24 March 2009 Paper

Improve scanner matching using automated real-time feedback control via scanner match maker (SMM)

Shian-Huan (Cooper) Chiu, Sheng-Hsiung Yu, Min-Hin Tung, Lei-Ken Wu, Ya-Tsz Yeh, James Manka, Chao-Tien (Healthy) Huang, John Robinson, Chin-Chou (Kevin) Huang, David Tien, YuYu Chen, Katsushi Makino, Jium-Ming Lin

Proceedings Volume 7272, 72723E (2009) https://doi.org/10.1117/12.814186

KEYWORDS: Scanners, Distortion, Semiconducting wafers, Overlay metrology, Phase modulation, Feedback control, Process control, Optical lithography, Metrology, Inspection

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Proceedings Article | 24 March 2009 Paper

Sampling strategy: optimization and correction for high-order overlay control for 45nm process node

Bo Yun Hsueh, George Huang, Chun-Chi Yu, Chin-Chou Kevin Huang, Chien-Jen Huang, James Manka, David Tien

Proceedings Volume 7272, 727231 (2009) https://doi.org/10.1117/12.812929

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Control systems, Metrology, Error analysis, Scanners, Lithography, Immersion lithography, Environmental sensing

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Proceedings Article | 24 March 2009 Paper

Advanced modeling strategies to improve overlay control for 32-nm lithography processes

Anna Minvielle, Lovejeet Singh, Jeffrey Schefske, Joerg Reiss, Eric Kent, Terry Manchester, Brad Eichelberger, Kelly O'Brien, Jim Manka, John Robinson, David Tien

Proceedings Volume 7272, 72722X (2009) https://doi.org/10.1117/12.814256

KEYWORDS: Semiconducting wafers, Data modeling, Overlay metrology, Scanners, Radium, Lithography, Visualization, Performance modeling, Immersion lithography, Double patterning technology

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Proceedings Article | 16 April 2008 Paper

Sampling for advanced overlay process control

DongSub Choi, Pavel Izikson, Doug Sutherland, Kara Sherman, Jim Manka, John Robinson

Proceedings Volume 6922, 69222U (2008) https://doi.org/10.1117/12.772738

KEYWORDS: Overlay metrology, Semiconducting wafers, Process control, Metrology, Time metrology, Scanners, Error analysis, Optical lithography, Lithography, Fourier transforms

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Proceedings Article | 24 March 2008 Paper

Improve overlay control and scanner utilization through high order corrections

Hung Ming Lin, Benjamin Lin, James Wu, Smixer Chiu, Chin-Chou Kevin Huang, James Manka, Desmond Goh, Healthy Huang, David Tien

Proceedings Volume 6922, 69222R (2008) https://doi.org/10.1117/12.772118

KEYWORDS: Semiconducting wafers, Scanners, Overlay metrology, Control systems, Manufacturing, Metrology, Data modeling, Process control, Semiconductors, Optical alignment

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Showing 5 of 8 publications

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