Dr. James D. Meador Profile

Dr. James D. Meador

Senior Research Scientist at Brewer Science Inc

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Author

Publications (15)

Proceedings Article | 31 March 2010 Paper

Photoresist-induced development behavior in DBARCs

Jim Meador, Alice Guerrero, Joyce Lowes, Charlyn Stroud, Brandy Carr, Anwei Qin, Carlton Washburn, Ramil-Marcelo Mercado

Proceedings Volume 7639, 763926 (2010) https://doi.org/10.1117/12.846927

KEYWORDS: Lithography, Photoresist materials, Silicon, Photoresist developing, Diffusion, Polymers, Lithographic illumination, Scanning electron microscopy, Scanners, Photography

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Proceedings Article | 26 March 2010 Paper

Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applications

Joyce Lowes, Victor Pham, Jim Meador, Charlyn Stroud, Ferdinand Rosas, Ramil-Marcelo Mercado, Mark Slezak

Proceedings Volume 7639, 76390K (2010) https://doi.org/10.1117/12.846608

KEYWORDS: Picosecond phenomena, Photoresist materials, Photoresist developing, Polymers, Lithography, Diffusion, Semiconducting wafers, Standards development, Chemistry, Quenching (fluorescence)

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Proceedings Article | 1 April 2009 Paper

Improving the performance of light-sensitive developer-soluble anti-reflective coatings by using adamantyl terpolymers

Jim Meador, Joyce Lowes, Charlyn Stroud, Sherilyn Thomas, Yilin Qiu, Ramil-Marcelo Mercado, Victor Pham, Mark Slezak

Proceedings Volume 7273, 727312 (2009) https://doi.org/10.1117/12.813783

KEYWORDS: Lithography, Photoresist materials, Photoresist developing, Polymers, Scanning electron microscopy, Antireflective coatings, Interferometers, Polymer thin films, Electroluminescence, Bandpass filters

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Proceedings Article | 4 December 2008 Paper

Acid-degradable hyperbranched polymer and its application in bottom anti-reflective coatings

Ramil-Marcelo Mercado, Hao Xu, Joyce Lowes, Jim Meador, Douglas Guerrero

Proceedings Volume 7140, 71402W (2008) https://doi.org/10.1117/12.804743

KEYWORDS: Polymers, Photoresist developing, Polymer thin films, Photoresist materials, Lithography, Coating, Molecules, Bottom antireflective coatings, Electroluminescence, Etching

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Proceedings Article | 15 April 2008 Paper

Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography

Jim Meador, Carol Beaman, Charlyn Stroud, Joyce Lowes, Zhimin Zhu, Douglas Guerrero, Ramil-Marcelo Mercado, David Drain

Proceedings Volume 6923, 69232W (2008) https://doi.org/10.1117/12.772793

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Diffractive optical elements, Reflectivity, Polymer thin films, Optical properties, Scanning electron microscopy

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Proceedings Article | 29 March 2006 Paper

Development of 193-nm wet BARCs for implant applications

Jim Meador, Carol Beaman, Joyce Lowes, Carlton Washburn, Ramil Mercado, Mariya Nagatkina, Charlyn Stroud

Proceedings Volume 6153, 61532P (2006) https://doi.org/10.1117/12.657597

KEYWORDS: Reflectivity, Photoresist materials, Silicon, Lithography, Polymers, Electroluminescence, Chemistry, Critical dimension metrology, Photoresist developing, Absorbance

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Proceedings Article | 14 May 2004 Paper

New materials for 193-nm trilayer imaging

Jim Meador, Doug Holmes, Mariya Nagatkina, Rama Puligadda, Denise Gum, Randy Bennett, Sam Sun, Tomoyuki Enomoto

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.533539

KEYWORDS: Etching, Plasma etching, Photoresist materials, Silicon, Plasma, Resistance, Reflectivity, Solids, Electroluminescence, Silicon films

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Proceedings Article | 12 June 2003 Paper

193-nm multilayer imaging systems

James Meador, Doug Holmes, William DiMenna, Mariya Nagatkina, Michael Rich, Tony Flaim, Randy Bennett, Ichiro Kobayashi

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485082

KEYWORDS: Etching, Photoresist materials, Reflectivity, Polymers, Plasma etching, Electroluminescence, Silicon, Optical coatings, Scanning electron microscopy, Multilayers

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Proceedings Article | 24 July 2002 Paper

Thin organic bottom antireflective coatings for 193 nm lithography

Mandar Bhave, James Meador, James Claypool, Shreeram Deshpande, Jill Akers, Anne Lindgren

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474183

KEYWORDS: Reflectivity, Photoresist materials, Polymers, Etching, Lithography, Bottom antireflective coatings, 193nm lithography, Absorbance, Optical properties, Critical dimension metrology

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Proceedings Article | 24 August 2001 Paper

Improved crosslinkable polymeric binders for 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Mandar Bhave, Chris Cox, John Thompson, Debra Thomas, Stephen Gibbons, Ashley Farnsworth, Michael Rich

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436918

KEYWORDS: Polymers, Photoresist materials, Reflectivity, Etching, Plasma etching, Lithography, Silicon, Scanning electron microscopy, Semiconducting wafers, Ions

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Proceedings Article | 23 June 2000 Paper

Second-generation 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Vandana Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James Claypool, Anne Lindgren

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388264

KEYWORDS: Reflectivity, Etching, Polymers, Plasma etching, Manufacturing, Photoresist materials, Lithography, Semiconducting wafers, Particles, Absorbance

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Proceedings Article | 11 June 1999 Paper

Recent progress in 193-nm antireflective coatings

James Meador, Douglas Guerrero, Gu Xu, Xie Shao, Norman Dobson, James Claypool, Kelly Nowak

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350269

KEYWORDS: Photoresist materials, Etching, Plasma etching, Polymers, Absorbance, Reflectivity, Plasma, Chemistry, Data modeling, Silicon

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Proceedings Article | 29 June 1998 Paper

Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate

Douglas Guerrero, James Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, James Lamb

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312412

KEYWORDS: Etching, Photoresist materials, Absorbance, Reflectivity, Deep ultraviolet, Critical dimension metrology, Chemistry, Lithography, Coating, Antireflective coatings

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Proceedings Article | 14 June 1996 Paper

Removable organic antireflection coating

John Sturtevant, Linda Insalaco, Tony Flaim, Vandana Krishnamurthy, James Meador, John Petersen, Andrew Eckert

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241872

KEYWORDS: Etching, Semiconducting wafers, Absorption, Antireflective coatings, Photoresist materials, Plasma etching, Deep ultraviolet, Ultraviolet radiation, Plasma, Photoresist processing

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Proceedings Article | 14 June 1996 Paper

Highly absorbing ARC for DUV lithography

Edward Pavelchek, James Meador, Douglas Guerrero, James Lamb, Ajit Kache, Manuel doCanto, Timothy Adams, David Stark, Daniel Miller

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241867

KEYWORDS: Photoresist materials, Etching, Coating, Absorbance, Silicon, Oxides, Lithography, Deep ultraviolet, Antireflective coatings, Reflectivity

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Showing 5 of 15 publications

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