Dr. James S. Papanu Profile

Dr. James S. Papanu

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Publications (4)

Proceedings Article | 17 October 2008 Paper

Tunable droplet momentum and cavitation process for damage-free cleaning of challenging particles

Roman Gouk, James Papanu, Fred Li, Jason Jeon, Tong Liu, Rao Yalamanchili

Proceedings Volume 7122, 712211 (2008) https://doi.org/10.1117/12.801549

KEYWORDS: Particles, Cavitation, SRAF, Nondestructive evaluation, Spherical lenses, Photomasks, Mask cleaning, Chemistry, Acoustics, Liquids

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Proceedings Article | 19 May 2008 Paper

Advanced damage-free photomask cleaning for 45/32nm technology nodes

Roman Gouk, Jason Jeon, Fred Li, James Papanu, Banqiu Wu, Rao Yalamanchili

Proceedings Volume 7028, 702808 (2008) https://doi.org/10.1117/12.793017

KEYWORDS: Particles, Nondestructive evaluation, Photomasks, Mask cleaning, Chemistry, Chromium, Scanning electron microscopy, Latex, Inspection, Liquids

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Proceedings Article | 21 June 2006 Paper

Advanced processes for photomask damage-free cleaning and photoresist removal

James Papanu, Roman Gouk, Han-Wen Chen, Pieter Boelen, Phillip Peters, Michael Belisle, Steven Verhaverbeke, Alexander Ko, Kent Child, Elias Martinez

Proceedings Volume 6281, 62810K (2006) https://doi.org/10.1117/12.692644

KEYWORDS: Chemistry, Particles, Photomasks, Photoresist materials, Reflectivity, Photoresist processing, Chromium, Ozone, Photoresist developing, Attenuators

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Proceedings Article | 5 November 2005 Paper

Advanced mask cleaning techniques for sub-100-nm technology nodes

James Papanu, Roman Gouk, Cole Franklin, Han-Wen Chen, Steven Verhaverbeke, Alexander Ko, Kent Child, Pieter Boelen, Suresh Shrauti, Elias Martinez, Brian Brown

Proceedings Volume 5992, 59921G (2005) https://doi.org/10.1117/12.632294

KEYWORDS: Particles, Photomasks, Chemistry, Chromium, Photoresist materials, Mask cleaning, Photoresist processing, Plasma, Phase shifts, Transmittance

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