Dr. Jan P. Heumann
Member of Technicall Staff at Advanced Mask Technology Ctr GmbH Co KG
SPIE Involvement:
Author
Publications (28)

Proceedings Article | 27 June 2019 Paper
Proc. SPIE. 11178, Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Inspection, Extreme ultraviolet, Defect inspection, Photomasks, Opacity, Optical inspection, Signal detection, Critical dimension metrology, Extreme ultraviolet lithography, Defect detection

Proceedings Article | 12 October 2018 Presentation
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, EUV optics, Extreme ultraviolet lithography, Lithography, Semiconducting wafers, Wafer-level optics, Defect detection, Optical inspection

Proceedings Article | 3 October 2018 Presentation + Paper
Proc. SPIE. 10810, Photomask Technology 2018
KEYWORDS: Inspection, Polarization, Extreme ultraviolet, Photomasks, Optical inspection, Defect detection, Semiconducting wafers, EUV optics, Defect inspection, Inspection equipment

Proceedings Article | 12 June 2018 Paper
Proc. SPIE. 10807, Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology
KEYWORDS: Inspection, Photomasks, Extreme ultraviolet, Polarization, Opacity, Defect detection, EUV optics, Deep ultraviolet, Defect inspection, Critical dimension metrology

Proceedings Article | 8 November 2012 Paper
Proc. SPIE. 8522, Photomask Technology 2012
KEYWORDS: Critical dimension metrology, Inspection, Photomasks, Scanning electron microscopy, Defect inspection, Spatial resolution, Semiconducting wafers, Control systems, Manufacturing, Data modeling

Showing 5 of 28 publications
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