Dr. Jan Klikovits Profile

Dr. Jan Klikovits

at GenISys GmbH

SPIE Involvement:

Author

Publications (13)

SPIE Journal Paper | 20 May 2024 Open Access

Universal approach for process optimization of chemically amplified photoresists in electron beam lithography

Markus Greul, Astrit Shoshi, Jan Klikovits, Stephan Martens, Ulrich Hofmann, Olga Barahona, Benyamin Shnirman, Leon Starz, Patrick Wintrich, Holger Sailer

JM3, Vol. 23, Issue 02, 024601, (May 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.2.024601

KEYWORDS: Photoresist materials, Photoresist developing, Critical dimension metrology, Photoresist processing, Electron beam lithography, Semiconducting wafers, Lithography, Standards development, Point spread functions, Monte Carlo methods

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Proceedings Article | 12 October 2021 Presentation + Paper

3D-MC modelling of particle contamination induced defects in ebeam mask writing

Jan Klikovits, Robert Polster, Ulrich Hofmann, Axel Feicke, Timo Wandel

Proceedings Volume 11855, 1185503 (2021) https://doi.org/10.1117/12.2600956

KEYWORDS: Electrons, Copper, Scattering, Monte Carlo methods, Polymethylmethacrylate, Particles, Particle contamination, Photomasks, Electron beam lithography

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Proceedings Article | 12 November 2018 Presentation + Paper

Mask process correction validation for multi-beam mask lithography

Ingo Bork, Peter Buck, Christian Bürgel, Bhardwaj Durvasula, Stefan Eder-Kapl, Peter Hudek, Michal Jurkovic, Jan Klikovits, Elmar Platzgummer, Jed Rankin, Rao Nageswara, Murali Reddy, Christoph Spengler

Proceedings Volume 10810, 108100K (2018) https://doi.org/10.1117/12.2503284

KEYWORDS: Photomasks, SRAF, Calibration, Cadmium, Lithography, Double patterning technology, Data modeling, Etching, Vestigial sideband modulation, Scanning electron microscopy

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Proceedings Article | 20 October 2016 Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Proceedings Volume 10032, 1003205 (2016) https://doi.org/10.1117/12.2247941

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, SRAF, Inspection, Metals, Optics manufacturing, Scanning electron microscopy, Logic, Lithography

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Proceedings Article | 26 September 2016 Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Proceedings Volume 9985, 99850R (2016) https://doi.org/10.1117/12.2243407

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Logic, Manufacturing, Metals, Inspection, Image processing, Information operations, Scanning electron microscopy

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Proceedings Article | 9 July 2015 Paper

Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Daniel Chalom, Jan Klikovits, David Geist, Peter Hudek, Stefan Eder-Kapl, Mehdi Daneshpanah, Frank Laske, Stefan Eyring, Klaus-Dieter Roeth

Proceedings Volume 9658, 965805 (2015) https://doi.org/10.1117/12.2196388

KEYWORDS: Photomasks, Metrology, Image registration, Nanofabrication, Calibration, Reticles, Beam shaping, Manufacturing, Lithography, Model-based design

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Proceedings Article | 26 March 2013 Paper

Contrast enhanced exposure strategy in multi-beam mask writing

Nikola Belic, Ulrich Hofmann, Jan Klikovits, Stephan Martens

Proceedings Volume 8680, 86802A (2013) https://doi.org/10.1117/12.2014148

KEYWORDS: Critical dimension metrology, Point spread functions, Photomasks, Monte Carlo methods, Standards development, Beam shaping, Model-based design, Opacity, Modulation, Extreme ultraviolet lithography

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Proceedings Article | 8 November 2012 Paper

Proximity effect correction optimizing image quality and writing time for an electron multi-beam mask writer

T. Klimpel, J. Klikovits, R. Zimmermann, M. Schulz, Alex Zepka, H.-J. Stock

Proceedings Volume 8522, 852229 (2012) https://doi.org/10.1117/12.964405

KEYWORDS: Image quality, Photomasks, Scanning electron microscopy, Nanoimprint lithography, Backscatter, Modulation, Acquisition tracking and pointing, Ions, Metals, Line width roughness

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Proceedings Article | 21 March 2012 Paper

Feasibility study of optical/e-beam complementary lithography

Christoph Hohle, Kang-Hoon Choi, Martin Freitag, Manuela Gutsch, Philipp Jaschinsky, Frank Kahlenberg, Christof Klein, Jan Klikovits, Jan Paul, Matthias Rudolph, Xaver Thrun

Proceedings Volume 8323, 83232C (2012) https://doi.org/10.1117/12.916386

KEYWORDS: Etching, Lithography, Electron beam lithography, Silicon, Semiconducting wafers, Photomasks, 193nm lithography, Electron beam direct write lithography, Beam shaping, Optics manufacturing

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Proceedings Article | 2 April 2011 Paper

eMET: 50 keV electron multibeam mask exposure tool

Christof Klein, Jan Klikovits, Hans Loeschner, Elmar Platzgummer

Proceedings Volume 7970, 79700C (2011) https://doi.org/10.1117/12.879419

KEYWORDS: Optical proximity correction, Critical dimension metrology, Photomasks, Ions, Optical simulations, Nanofabrication, Projection systems, Electron beams, Beam controllers, Control systems

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Proceedings Article | 29 September 2010 Paper

eMET: 50 keV electron mask exposure tool development based on proven multi-beam projection technology

Elmar Platzgummer, Stefan Cernusca, Christof Klein, Jan Klikovits, Samuel Kvasnica, Hans Loeschner

Proceedings Volume 7823, 782308 (2010) https://doi.org/10.1117/12.864261

KEYWORDS: Photomasks, Lithography, Projection systems, Chromium, Quartz, Nanofabrication, Control systems, Ions, 193nm lithography, Particles

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Proceedings Article | 1 April 2010 Paper

50 keV electron-beam projection maskless lithography (PML2): results obtained with 2,500 programmable 12.5-nm sized beams

Christof Klein, Jan Klikovits, Laszlo Szikszai, Elmar Platzgummer, Hans Loeschner

Proceedings Volume 7637, 76370B (2010) https://doi.org/10.1117/12.846544

KEYWORDS: Semiconducting wafers, Maskless lithography, Lithography, Electronics, Silicon, Scanning electron microscopy, Electron beam lithography, Projection systems, CMOS technology, Electrodes

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Proceedings Article | 18 March 2009 Paper

PML2: the maskless multibeam solution for the 22nm node and beyond

C. Klein, E. Platzgummer, J. Klikovits, W. Piller, H. Loeschner, T. Bejdak, P. Dolezel, V. Kolarik, W. Klingler, F. Letzkus, J. Butschke, M. Irmscher, M. Witt, W. Pilz, P. Jaschinsky, F. Thrum, C. Hohle, J. Kretz, J. Nogatch, A. Zepka

Proceedings Volume 7271, 72710N (2009) https://doi.org/10.1117/12.813670

KEYWORDS: Semiconducting wafers, Lithography, Electron beams, Electrodes, Prototyping, Electron beam lithography, Electron beam direct write lithography, Silicon, Optical alignment, Photomasks

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Showing 5 of 13 publications

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