Mr. Jason R. Cantone Profile

Jason R. Cantone

Regional Manager

SPIE Involvement:

Author

Publications (12)

Proceedings Article | 28 March 2017 Presentation + Paper

In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions

Eric Solecky, Oliver Patterson, Andrew Stamper, Allen Rasafar, Benjamin Bunday, Kevin Wu, Jason Cantone, Alok Vaid, Weihao Weng, Xintuo Dai, Ralf Buengener

Proceedings Volume 10145, 101450R (2017) https://doi.org/10.1117/12.2261524

KEYWORDS: Defect inspection, Metrology, Process control, Critical dimension metrology, Inspection, Optical lithography, Semiconducting wafers, Dimensional metrology, Overlay metrology, Manufacturing, Electron beam lithography, Image resolution, Scanning electron microscopy, Image processing

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Proceedings Article | 18 March 2016 Paper

EUV and optical lithographic pattern shift at the 5nm node

Deniz Civay, Erik Hosler, Jason Cantone, Sathish Thiruvengadam, Uwe Schroeder

Proceedings Volume 9776, 977616 (2016) https://doi.org/10.1117/12.2217532

KEYWORDS: Extreme ultraviolet, Optical lithography, Photomasks, Monte Carlo methods, Extreme ultraviolet lithography, Lithography, Personal protective equipment, Critical dimension metrology, EUV optics, Transistors

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Proceedings Article | 2 April 2014 Paper

Improving SEM image quality using pixel super resolution technique

Myungjun Lee, Jason Cantone, Ji Xu, Lei Sun, Ryoung-han Kim

Proceedings Volume 9050, 90500U (2014) https://doi.org/10.1117/12.2046426

KEYWORDS: Lawrencium, Scanning electron microscopy, Image resolution, Image quality, Distortion, Super resolution, Semiconducting wafers, Image processing, Metrology, Image enhancement

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Proceedings Article | 28 March 2014 Paper

Towards electrical testable SOI devices using Directed Self-Assembly for fin formation

Chi-Chun Liu, Cristina Estrada-Raygoza, Hong He, Michael Cicoria, David Hetzer, Vinayak Rastogi, Nihar Mohanty, Akiteru Ko, Hsinyu Tsai, Anthony Schepis, Jason Cantone, Sylvie Mignot, Ryoung-Han Kim, Michael Guillorn, Melia Tjio, Joy Cheng, Mark Somervell, Matthew Colburn, Kafai Lai, Robin Chao, Derrick Liu

Proceedings Volume 9049, 904909 (2014) https://doi.org/10.1117/12.2046462

KEYWORDS: Etching, Silicon, Polymethylmethacrylate, Semiconducting wafers, Scatterometry, Image processing, 3D modeling, Line edge roughness, Defect detection, Directed self assembly

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Proceedings Article | 20 March 2012 Paper

Assessment of negative tone development challenges

Lior Huli, Hirokazu Kato, Shyng-Tsong Chen, Yunpeng Yin, Terry Spooner, Dave Hetzer, Yu Yang Sun, Jeong Soo Kim, Martin Glodde, Sohan Mehta, Chiahsun Tseng, Mark Kelling, Shinichiro Kawakami, Martin Burkhardt, Matthew Colburn, Jerome Wandell, James Chen, Peggy Lawson, Yann Mignot, Yoshinori Matsui, Bassem Hamieh, Vikrant Chauhan, David Horak, Yannick Loquet, Chiew-Seng Koay, Sean Burns, John Arnold, Shannon Dunn, Guillaume Landie, Alan Thomas, Yongan Xu, Jason Cantone

Proceedings Volume 8325, 832506 (2012) https://doi.org/10.1117/12.917560

KEYWORDS: Semiconducting wafers, Polymers, Optical proximity correction, Reactive ion etching, Etching, Scanning electron microscopy, Neodymium, Photoresist developing, Image processing, Roads

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Proceedings Article | 16 April 2011 Paper

Negative-tone imaging (NTI) at the 22nm node: process and material development

Yongan Xu, Karen Petrillo, Shinichiro Kawakami, Shannon Dunn, Jason Cantone, Guillaume Landie, Matt Colburn

Proceedings Volume 7972, 79720M (2011) https://doi.org/10.1117/12.879719

KEYWORDS: Image processing, Photoresist developing, Semiconducting wafers, Photoresist materials, Standards development, Scanning electron microscopy, Lithography, Thin film coatings, Reticles, Materials processing

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Proceedings Article | 23 March 2011 Paper

Towards manufacturing of advanced logic devices by double-patterning

Scott Halle, Chiew-seng Koay, Jason Cantone, Matthew Colburn, Lior Huli, Shannon Dunn, Karen Petrillo, Brian Martinick, Steven Holmes, Aiqin Jiang, Youri van Dommelen, Shinichiro Kawakami, Martin Rodgers, David Hetzer, Michael Crouse

Proceedings Volume 7973, 79730F (2011) https://doi.org/10.1117/12.879618

KEYWORDS: Semiconducting wafers, Overlay metrology, Optical alignment, Silicon, Scanners, Scanning electron microscopy, Critical dimension metrology, Data modeling, Manufacturing, Double patterning technology

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Proceedings Article | 26 March 2010 Paper

Controlling 2D aspect ratio of elliptical contact level interconnects utilizing spin-on and reactive ion etch critical dimension shrink for the 22-nm node

Dave Hetzer, Shinichiro Kawakami, Tom Winter, Susan Fan, Andrew Metz, Karen Petrillo, Shannon Dunn, Dave Horak, Matthew Colburn, Jason Cantone

Proceedings Volume 7639, 76392Z (2010) https://doi.org/10.1117/12.846625

KEYWORDS: Reactive ion etching, Critical dimension metrology, Etching, Chemical reactions, Lithography, Ions, Cadmium, Double patterning technology, Chemistry, Scanning electron microscopy

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Proceedings Article | 4 March 2010 Paper

Evaluation of double-patterning techniques for advanced logic nodes

David Hetzer, Karen Petrillo, Aiqin Jiang, Shinichiro Kawakami, Youri van Dommelen, Hideyuki Tomizawa, Matthew Colburn, Shannon Dunn, Sumanth Kini, Jason Cantone, Michael Many, Martin Rodgers, Sean Burns, Lior Huli, Steven Holmes, Robert Routh, Chiew-Seng Koay, Brian Martinick

Proceedings Volume 7640, 764009 (2010) https://doi.org/10.1117/12.846769

KEYWORDS: Double patterning technology, Semiconducting wafers, Scanners, Overlay metrology, Photoresist processing, Chemical reactions, Semiconductors, Thin film coatings, Scanning electron microscopy, Logic

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Proceedings Article | 1 April 2009 Paper

Utilization of spin-on and reactive ion etch critical dimension shrink with double patterning for 32 nm and beyond contact level interconnects

Susan Fan, Erin McLellan, Cherry Tang, Mark Slezak, Vaidyanathan Balasubramaniam, Andrew Metz, Karen Petrillo, Tom Winter, Dave Horak, Matt Colburn, Jason Cantone, Shannon Dunn, Kenichi Ueda, Dave Hetzer

Proceedings Volume 7273, 72731A (2009) https://doi.org/10.1117/12.814260

KEYWORDS: Reactive ion etching, Etching, Critical dimension metrology, Double patterning technology, Lithography, Ions, Semiconducting wafers, Cadmium, Scanners, Solar thermal energy

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Proceedings Article | 1 April 2009 Paper

Defectivity issues in topcoat-free photoresists

Will Conley, Aiqin Jiang, Dave Hetzer, Shannon Dunn, Rick Johnson, Jason Cantone, Karen Petrillo, Tom Winter, Youri van Dommelen

Proceedings Volume 7273, 72732C (2009) https://doi.org/10.1117/12.828291

KEYWORDS: Photoresist materials, Semiconducting wafers, Lithography, Diffractive optical elements, Scanning electron microscopy, Photoresist developing, Particles, Standards development, Immersion lithography, Manufacturing

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Proceedings Article | 1 April 2009 Paper

Engine for characterization of defects, overlay, and critical dimension control for double exposure processes for advanced logic nodes

Mark Slezak, Karen Petrillo, Judy Galloway, Jason Cantone, Matthew Colburn, Cherry Tang, Kuang-Jung Chen, Tony DiBiase, Kenichi Ueda, Michael Crouse, Emil Schmitt-Weaver, Youri van Dommelen, Sumanth Kini, Steven Holmes, Andrew Metz, Chiew-Seng Koay, Robert Routh, Aiquin Jiang, Shannon Dunn

Proceedings Volume 7273, 727305 (2009) https://doi.org/10.1117/12.828483

KEYWORDS: Overlay metrology, Semiconducting wafers, Double patterning technology, Lithography, Semiconductors, Defect inspection, Scanning electron microscopy, Logic, Polymers, Photomasks

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Showing 5 of 12 publications

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