Jason Lee
Sr. Principal Engineer at Cymer LLC
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2011 Paper
Proceedings Volume 7973, 797328 (2011) https://doi.org/10.1117/12.882391
KEYWORDS: Laser drilling, Lithography, Metrology, Semiconducting wafers, Electroluminescence, Optical lithography, Immersion lithography, Critical dimension metrology, Photomasks, Chromatic aberrations

Proceedings Article | 12 May 2005 Paper
Gary Zhang, Mark Mason, Robert Soper, Steven Hansen, Jason Lee, Sean O'Brien, Joe Ganeshan, Won Kim, Mark Terry, Changan Wang
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600409
KEYWORDS: SRAF, Critical dimension metrology, Optical proximity correction, Photomasks, Scanners, Lithographic illumination, Semiconducting wafers, Phase shifts, Lithography, Resolution enhancement technologies

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