Mr. Javier Loaiza Rivas Profile

Javier Loaiza Rivas

at ASML Netherlands BV

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Publications (1)

Proceedings Article | 28 April 2023 Paper

Improvement of CD uniformity using a new selective exposure focusing method

Seonho Lee, Jaewoong Sohn, Hyosung Lee, Jaehyung Jung, Youngjun Kim, Heehong Lee, HyoungHwa Jin, Harim Oh, Yongchan Kim, Maarten Boogaarts, Nataliya Nishchenko, Jin-Sung Kim, Noh-Kyoung Park, Sang-Jin Kim, Javier Loaiza Rivas, Jens Wustenfeld, Martin de Nivelle, Valerio Altini

Proceedings Volume 12494, 124940Y (2023) https://doi.org/10.1117/12.2657203

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Sensors, Scanners, High volume manufacturing, Lithography, Optical lithography, Distributed interactive simulations, Device simulation, Process control

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