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Jay Lee
at Synopsys, Inc.
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 23 March 2020 Paper
Impact of flare on source mask optimization in EUVL for 7nm technology node
Proceedings Volume 11323, 113232E (2020) https://doi.org/10.1117/12.2552008
KEYWORDS: Photomasks, Extreme ultraviolet lithography, Source mask optimization, Nanoimprint lithography, Lithography, Extreme ultraviolet, Electroluminescence, Reflectivity, Critical dimension metrology, Light scattering
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