Mr. Jayk Barker Profile

Jayk Barker

at The University of Central Florida

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Proceedings Article | 14 March 2016 Paper

Multi-photon lithography of 3D micro-structures in As2S3 and Ge5(As2Se3)95 chalcogenide glasses

Casey Schwarz, Shreya Labh, Jayk Barker, Ryan Sapia, Gerald Richardson, Clara Rivero-Baleine, Benn Gleason, Kathleen Richardson, Alexej Pogrebnyakov, Theresa Mayer, Stephen Kuebler

Proceedings Volume 9759, 975916 (2016) https://doi.org/10.1117/12.2213030

KEYWORDS: Multiphoton lithography, Lithography, Chalcogenide glass, Arsenic, Refractive index, Etching, Germanium, Selenium, Refraction, Scanning electron microscopy

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This work reports a detailed study of the processing and photo-patterning of two chalcogenide glasses (ChGs) − arsenic trisulfide (As₂S₃) and a new composition of germanium-doped arsenic triselenide Ge5(As2Se3)95 − as well as their use for creating functional optical structures. ChGs are materials with excellent infrared (IR) transparency, large index of refraction, low coefficient of thermal expansion, and low change in refractive index with temperature. These features make them well suited for a wide range of commercial and industrial applications including detectors, sensors, photonics, and acousto-optics. Photo-patternable films of As₂S₃ and Ge₅(As₂Se₃)₉₅ were prepared by thermally depositing the ChGs onto silicon substrates. For some As₂S₃ samples, an anti-reflection layer of arsenic triselenide (As₂Se₃) was first added to mitigate the effects of standing-wave interference during laser patterning. The ChG films were photo-patterned by multi-photon lithography (MPL) and then chemically etched to remove the unexposed material, leaving free-standing structures that were negative-tone replicas of the photo-pattern in networked-solid ChG. The chemical composition and refractive index of the unexposed and photo-exposed materials were examined using Raman spectroscopy and near-IR ellipsometry. Nano-structured arrays were photo-patterned and the resulting nano-structure morphology and chemical composition were characterized and correlated with the film compositions, conditions of thermal deposition, patterned irradiation, and etch processing. Photo-patterned Ge₅(As₂Se₃)₉₅ was found to be more resistant than As₂S₃ toward degradation by formation of surface oxides.

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