Prof. Jea-Young Jun Profile

Prof. Jea-Young Jun

at SK Hynix Inc

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 17 October 2014 Paper

Particle reduction and control in EUV etching process

JeaYoung Jun, TaeJoong Ha, SangPyo Kim, DongGyu Yim

Proceedings Volume 9235, 92351E (2014) https://doi.org/10.1117/12.2066297

KEYWORDS: Etching, Extreme ultraviolet, Photomasks, Inspection, Particles, Plasma, Control systems, Manufacturing, Scanning electron microscopy, Plasma etching

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Proceedings Article | 14 October 2011 Paper

A study on irregular growing defect mechanism and removal process

Hyemi Lee, JeaYoung Jun, GooMin Jeong, SangChul Kim, SangPyo Kim, ChangReol Kim

Proceedings Volume 8166, 816613 (2011) https://doi.org/10.1117/12.898975

KEYWORDS: Air contamination, Ions, Chromium, Photomasks, Oxygen, Transmittance, Semiconducting wafers, Image processing, Transmission electron microscopy, Etching

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Proceedings Article | 29 September 2010 Paper

Advanced mask CD MTT correction technique through improvement of CD measurement repeatability of CD SEM

Choong Han Ryu, Ho Yong Jung, Jea Young Jun, Tae Joong Ha, Chang Reol Kim, Oscar Han

Proceedings Volume 7823, 78232J (2010) https://doi.org/10.1117/12.864522

KEYWORDS: Critical dimension metrology, Chromium, Scanning electron microscopy, Etching, Dry etching, Image processing, Reliability, Electron beam lithography, Calibration, Photomasks

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Proceedings Article | 30 October 2007 Paper

The advanced mask CD MTT control using dry etch process for sub 65 nm tech

Sang Jin Jo, Ho Yong Jung, Dong Wook Lee, Jae Cheon Shin, Jea Young Jun, Tae Joong Ha, Oscar Han

Proceedings Volume 6730, 673008 (2007) https://doi.org/10.1117/12.746646

KEYWORDS: Etching, Chromium, Dry etching, Critical dimension metrology, Photomasks, Reliability, Electron beams, Scanning electron microscopy, Process control, Semiconductors

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Proceedings Article | 5 November 2005 Paper

The surface treatment for prevention of growing defect

Jea-Young Jun, Ji-Sun Ryu, Yongk-Yoo Choi, Oscar Han

Proceedings Volume 5992, 59921F (2005) https://doi.org/10.1117/12.632044

KEYWORDS: Photomasks, Heat treatments, Ions, Etching, Dry etching, Atomic force microscopy, Glasses, Wet etching, Air contamination, Molybdenum

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Proceedings Article | 6 December 2004 Paper

Mask defect inspection study with high-speed mask inspection system

Jeayoung Jun, Hyunchul Kim, Sungjin Choi, Yong Kyoo Choi, Oscar Han

Proceedings Volume 5567, (2004) https://doi.org/10.1117/12.569226

KEYWORDS: Inspection, Photomasks, Particles, Chromium, Defect inspection, Electron beam lithography, Critical dimension metrology, Nd:YAG lasers, Defect detection, Process control

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Showing 5 of 6 publications

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