Dr. Jean Massin
at STMicroelectronics
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 29 October 2014 Paper
Proc. SPIE. 9235, Photomask Technology 2014
KEYWORDS: Reticles, Metrology, Etching, Metals, Scanners, Image registration, Photomasks, Optical alignment, Semiconducting wafers, Overlay metrology

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Reticles, Metrology, Quartz, Control systems, Photoresist materials, Scatterometry, Photomasks, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 5 April 2012 Paper
Proc. SPIE. 8324, Metrology, Inspection, and Process Control for Microlithography XXVI
KEYWORDS: Lithography, Metrology, Logic, Databases, Etching, Scanners, Control systems, Process control, Photomasks, Semiconducting wafers

Proceedings Article | 23 March 2011 Paper
Proc. SPIE. 7973, Optical Microlithography XXIV
KEYWORDS: Lithography, Control systems, Photoresist materials, Scatterometry, Process control, Finite element methods, Deconvolution, Critical dimension metrology, Semiconducting wafers, Scatter measurement

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Metrology, Logic, Optical lithography, Etching, Scanners, Process control, Photomasks, Critical dimension metrology, Semiconducting wafers, Airborne remote sensing

Showing 5 of 9 publications
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