Dr. Jedsada Manyam Profile

Dr. Jedsada Manyam

at Univ of Birmingham

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Author

Publications (6)

Proceedings Article | 19 March 2012 Paper

Positive-tone chemically amplified fullerene resist

J. Manyam, A. Frommhold, D. Yang, A. McClelland, M. Manickam, J. Preece, R. Palmer, A. P. Robinson

Proceedings Volume 8325, 83251U (2012) https://doi.org/10.1117/12.916472

KEYWORDS: Magnesium, Fullerenes, Silica, Optical lithography, Chromatography, Nitrogen, Solids, Lithography, Glasses, Chemically amplified resists

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Proceedings Article | 17 March 2012 Paper

High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask

A. Frommhold, J. Manyam, R. Palmer, A. Robinson

Proceedings Volume 8328, 83280U (2012) https://doi.org/10.1117/12.916426

KEYWORDS: Etching, Silicon, System on a chip, Carbon, Fullerenes, Photoresist materials, Silicon carbide, Coating, Oxygen, Semiconducting wafers

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Proceedings Article | 16 April 2011 Paper

Plasma etching of high-resolution features in a fullerene molecular resist

J. Manyam, M. Manickam, J. Preece, R. Palmer, A. P. Robinson

Proceedings Volume 7972, 79722N (2011) https://doi.org/10.1117/12.879469

KEYWORDS: Etching, Silicon, Fullerenes, Plasma etching, Plasma, Photoresist processing, Oxygen, Gases, Electron beam lithography, Lithography

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Proceedings Article | 30 March 2010 Paper

Characterization of the effects of base additives on a fullerene chemically amplified resist

Jedsada Manyam, Mayandithevar Manickam, Jon Preece, Richard Palmer, Alex Robinson

Proceedings Volume 7639, 76391N (2010) https://doi.org/10.1117/12.846581

KEYWORDS: Fullerenes, Chemically amplified resists, Line width roughness, Electron beam lithography, Electron beams, Lithography, Etching, Epoxies, Photoresist processing, Scanning electron microscopy

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Proceedings Article | 1 April 2009 Paper

Low activation energy fullerene molecular resist

J. Manayam, M. Manickam, J. Preece, R. Palmer, A. P. Robinson

Proceedings Volume 7273, 72733D (2009) https://doi.org/10.1117/12.814088

KEYWORDS: Fullerenes, Line width roughness, Photoresist processing, Diffusion, Image processing, Humidity, Lithography, Etching, Chemically amplified resists, Epoxies

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Proceedings Article | 15 April 2008 Paper

Chemically amplified fullerene resists for e-beam lithography

J. Manyam, F. Gibbons, S. Diegoli, M. Manickam, J. Preece, R. Palmer, A. P. Robinson

Proceedings Volume 6923, 69230M (2008) https://doi.org/10.1117/12.772645

KEYWORDS: Etching, Fullerenes, Line width roughness, Electron beam lithography, Lithography, Photoresist processing, Scanning electron microscopy, Polymers, Electron beams, Carbon

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Showing 5 of 6 publications

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