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Dr. Jeffery Hodges
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Publications (1)
Proceedings Article | 24 March 2016 Paper
Overlay metrology performance prediction fidelity: the factors enabling a successful target design cycle
Inna Tarshish-Shapir, Eitan Hajaj, Greg Gray, Jeffery Hodges, Jianming Zhou, Sarah Wu, Sam Moore, Guy Ben-Dov, Chen Dror, Ze'ev Lindenfeld, David Gready, Mark Ghinovker, Mike Adel
Proceedings Volume 9778, 97782J (2016) https://doi.org/10.1117/12.2219181
KEYWORDS: Metrology, Overlay metrology, Electromagnetic simulation, Reflectivity, Diffraction, Semiconducting wafers, Inspection, Scatterometry, Polarization, Device simulation, Interference (communication), Optical design, Light sources
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