Dr. Jelle Vandereyken
at imec
SPIE Involvement:
Author
Publications (5)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11612, Advances in Patterning Materials and Processes XXXVIII
KEYWORDS: Lithography, Photoresist materials, Extreme ultraviolet, Line width roughness, Extreme ultraviolet lithography, Thin film coatings, Photoresist developing

Proceedings Article | 23 March 2020 Presentation + Paper
Proc. SPIE. 11326, Advances in Patterning Materials and Processes XXXVII
KEYWORDS: Particles, Inspection, Bridges, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Defect inspection

Proceedings Article | 13 March 2018 Presentation + Paper
Proc. SPIE. 10586, Advances in Patterning Materials and Processes XXXV
KEYWORDS: Lithography, Reticles, Optical lithography, Etching, Ultraviolet radiation, Annealing, Photoresist materials, Line width roughness, Line edge roughness, Semiconducting wafers

Proceedings Article | 27 March 2017 Paper
Proc. SPIE. 10146, Advances in Patterning Materials and Processes XXXIV
KEYWORDS: Lithography, Particles, Scanning electron microscopy, Photoresist materials, Frequency modulation, Finite element methods, Bridges, Line width roughness, Fermium, Immersion lithography, Line edge roughness, Semiconducting wafers

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10143, Extreme Ultraviolet (EUV) Lithography VIII
KEYWORDS: Lithography, Etching, Photomasks, Extreme ultraviolet, Plasma enhanced chemical vapor deposition, Plasma etching, Extreme ultraviolet lithography, High volume manufacturing, Reactive ion etching, Stochastic processes, Focus stacking software

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