Dr. Jen-Shiang Wang
Senior Engineer at ASML
SPIE Involvement:
Author
Publications (11)

Proceedings Article | 22 February 2021 Presentation + Paper
Proc. SPIE. 11609, Extreme Ultraviolet (EUV) Lithography XII
KEYWORDS: Metrology, Defect detection, Data modeling, Calibration, Pattern recognition, Inspection, Wafer inspection, Semiconducting wafers, Failure analysis, Stochastic processes

Proceedings Article | 22 March 2018 Paper
Proc. SPIE. 10585, Metrology, Inspection, and Process Control for Microlithography XXXII
KEYWORDS: Metrology, Data modeling, Calibration, Image processing, Error analysis, Scanning electron microscopy, Time metrology, Optical proximity correction, Critical dimension metrology, Semiconducting wafers

Proceedings Article | 24 March 2017 Presentation + Paper
Proc. SPIE. 10147, Optical Microlithography XXX
KEYWORDS: Optical lithography, Calibration, Etching, Plasma etching, Optical proximity correction, Reactive ion etching, Plasma

Proceedings Article | 29 September 2010 Paper
Proc. SPIE. 7823, Photomask Technology 2010
KEYWORDS: Point spread functions, Electron beams, Data modeling, Scattering, Chromium, Monte Carlo methods, Photomasks, Extreme ultraviolet, Tantalum, Process modeling

Proceedings Article | 27 May 2010 Paper
Proc. SPIE. 7748, Photomask and Next-Generation Lithography Mask Technology XVII
KEYWORDS: Metrology, Optical lithography, Scattering, Manufacturing, Time metrology, Photomasks, Extreme ultraviolet, Computational lithography, Critical dimension metrology, EUV optics

Showing 5 of 11 publications
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