Dr. Jens Busch
at GLOBALFOUNDRIES Dresden
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Reticles, Calibration, Metals, Scanners, Photomasks, Optical proximity correction, Critical dimension metrology, Semiconducting wafers, Tolerancing, Binary data

Proceedings Article | 2 April 2011 Paper
Proc. SPIE. 7985, 27th European Mask and Lithography Conference
KEYWORDS: Wafer-level optics, Lithography, Reticles, Image processing, Scanners, Manufacturing, Thermal effects, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 2 April 2010 Paper
Proc. SPIE. 7638, Metrology, Inspection, and Process Control for Microlithography XXIV
KEYWORDS: Lithography, Metrology, Data modeling, Scanners, Control systems, Scatterometry, Time metrology, Process control, Semiconducting wafers, Overlay metrology

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Metrology, Logic, Optical lithography, Oscillators, Etching, Scanners, Photomasks, Line width roughness, Transistors, Semiconducting wafers

Proceedings Article | 4 April 2007 Paper
Proc. SPIE. 6518, Metrology, Inspection, and Process Control for Microlithography XXI
KEYWORDS: Reticles, Metrology, Data modeling, Scanners, Error analysis, Image registration, Pellicles, Photomasks, Semiconducting wafers, Overlay metrology

Showing 5 of 6 publications
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