Dr. Jens Schneider
Principal Lithography
SPIE Involvement:
Author
Area of Expertise:
Lithography , Litho Process Development , Litho Materials , Innovation Topics
Publications (12)

Proceedings Article | 19 September 2018 Paper
Proc. SPIE. 10775, 34th European Mask and Lithography Conference
KEYWORDS: Lithography, Ions, Manufacturing, Doping, Photomasks, Ion implantation, Semiconductor manufacturing, Photoresist processing, Semiconducting wafers, Grayscale lithography

Proceedings Article | 28 March 2014 Paper
Proc. SPIE. 9054, Advanced Etch Technology for Nanopatterning III
KEYWORDS: Etching, Metals, Chemistry, Oxygen, Photomasks, Critical dimension metrology, Photoresist processing, Semiconducting wafers, Plasma, Tin

Proceedings Article | 12 April 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Oxides, Lithography, Etching, Ions, Atomic force microscopy, Photoresist materials, Photomasks, Reactive ion etching, Semiconducting wafers, Grayscale lithography

Proceedings Article | 29 March 2013 Paper
Proc. SPIE. 8683, Optical Microlithography XXVI
KEYWORDS: Lithography, Optical lithography, Ions, Silicon, Doping, Photomasks, Ion implantation, Photoresist processing, Semiconducting wafers, Grayscale lithography

Proceedings Article | 20 April 2011 Paper
Proc. SPIE. 7971, Metrology, Inspection, and Process Control for Microlithography XXV
KEYWORDS: Lithography, Contamination, Etching, Metals, Particles, Dielectrics, Reliability, Dielectric filters, Semiconducting wafers, Bottom antireflective coatings

Showing 5 of 12 publications
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