Dr. Jeong-Ho Yeo
Product Marketing
SPIE Involvement:
Author
Area of Expertise:
Lithography , Wafer Inspection , Metrology
Publications (46)

Proceedings Article | 16 April 2024 Presentation + Paper
Il Hwan Kim, Cheolgyu Hyun, Sangho Jo, Muyoung Lee, Ikjun Jang, Jongsu Kim, Jinhong Park, Yigwon Kim, Chang Min Park, Kevin Houchens, Jenny Perry, Nahum Bomshtein, Liad Anokov, Noam Oved, Uri Smolyan, Michael Shifrin, Tal Itzkovich, Jeong Ho Yeo, You Jin Kim, Baek Jun Kim
Proceedings Volume 12955, 129551I (2024) https://doi.org/10.1117/12.3010511
KEYWORDS: Design, Scanning electron microscopy, Overlay metrology, Monte Carlo methods, Electrons, Lithography, Precision measurement, Electron beam lithography, Design rules, Signal detection

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 1295517 (2024) https://doi.org/10.1117/12.3012913
KEYWORDS: Shrinkage, Etching, Extreme ultraviolet, Photoresist materials, Metrology, Semiconducting wafers, Extreme ultraviolet lithography, Photoacid generators, Stochastic processes, Critical dimension metrology

Proceedings Article | 10 April 2024 Presentation + Paper
Proceedings Volume 12955, 129550N (2024) https://doi.org/10.1117/12.3010831
KEYWORDS: Metrology, Overlay metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Metals, High volume manufacturing, Contour extraction, Computer aided design, Design

Proceedings Article | 10 April 2024 Presentation + Paper
Taekwon Jee, Joonsang You, Hong-Goo Lee, Seungmo Hong, Jonghoi Cho, Taeseop Lee, Jong-hyun Seo, Michael Shifrin, Ronnie Porat, Amir Rosen, Rohit Kumar Singh, Jeong-Ho Yeo, Younghoon Kim, Jun Park, Byung-Jo Lim, Chan-Hee Kwak
Proceedings Volume 12955, 129550P (2024) https://doi.org/10.1117/12.3010813
KEYWORDS: Overlay metrology, Critical dimension metrology, Metrology, Semiconducting wafers, Stochastic processes, Time metrology, Design, Data modeling, Process control, Optical lithography

Proceedings Article | 27 April 2023 Poster + Paper
Proceedings Volume 12496, 1249622 (2023) https://doi.org/10.1117/12.2660118
KEYWORDS: Shrinkage, Photoresist materials, Extreme ultraviolet lithography, Critical dimension metrology, Photoacid generators, Metrology, Extreme ultraviolet, Etching, Electron beams, Outgassing

Showing 5 of 46 publications
Conference Committee Involvement (6)
Extreme Ultraviolet (EUV) Lithography V
24 February 2014 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography IV
25 February 2013 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography III
13 February 2012 | San Jose, California, United States
Extreme Ultraviolet (EUV) Lithography II
28 February 2011 | San Jose, California, United States
SPIE Lithography Asia - Korea
13 October 2010 | n/a, Republic of Korea
Showing 5 of 6 Conference Committees
SIGN IN TO:
  • View contact details

UPDATE YOUR PROFILE
Is this your profile? Update it now.
Don’t have a profile and want one?

Advertisement
Advertisement
Back to Top