Jeong-Sik Kim
Deputy General Manager at Dongjin Semichem Co Ltd
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 23 March 2010 Paper
Proceedings Volume 7636, 76362Y (2010) https://doi.org/10.1117/12.846518
KEYWORDS: Diffusion, Polymers, Extreme ultraviolet lithography, Line width roughness, Extreme ultraviolet, Deep ultraviolet, Line edge roughness, Optical lithography, Semiconducting wafers, Chemically amplified resists

Proceedings Article | 1 April 2009 Paper
Jeongsik Kim, Jae-Woo Lee, Deogbae Kim, Jaehyun Kim, Sung-Il Ahn, Wang-Cheol Zin
Proceedings Volume 7273, 72732W (2009) https://doi.org/10.1117/12.814449
KEYWORDS: X-rays, Reflectivity, Glasses, Line width roughness, Extreme ultraviolet lithography, Lithography, Extreme ultraviolet, Chemical analysis, Molecular interactions, Polymers

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