Dr. Jeong-Yun Lee Profile

Dr. Jeong-Yun Lee

Principal Engineer at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Area of Expertise:

Strong Expert in High Reliable Dry Etching Process , FEOL etching , RMG , Plasma Damage , Source Drain etching , Strained Engineering

Publications (9)

Proceedings Article | 17 December 2003 Paper

Research on the origin of particle generation in ICP plasma reactor

Jeong-Yoon Lee, Nam-Kyu Kim, Il-Yong Jang, Sung-Yong Mun, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517957

KEYWORDS: Particles, Plasma, Chemistry, Plasma etching, Etching, Polymers, Ions, Photomasks, Aluminum, Critical dimension metrology

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Proceedings Article | 17 December 2003 Paper

New method for approaching the loading-free process for photomask Cr etching

Il-Yong Jang, Jeong-Yun Lee, Sung-Yong Moon, Seong-Woon Choi, Jung-Min Sohn

Proceedings Volume 5256, (2003) https://doi.org/10.1117/12.517842

KEYWORDS: Etching, Chromium, Photomasks, Oxygen, Dry etching, Chlorine, Critical dimension metrology, Manufacturing, Mask making, Scanning electron microscopy

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Proceedings Article | 28 August 2003 Paper

Developement of etch rate uniformity adjustment technology for photomask quartz etch in manufacturing the 100% attenuated PSM

Il-Yong Jang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Jung-Min Sohn

Proceedings Volume 5130, (2003) https://doi.org/10.1117/12.504196

KEYWORDS: Etching, Photomasks, Quartz, Manufacturing, Ions, Plasma, Dry etching, Resolution enhancement technologies, Chromium, Integrated circuits

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Proceedings Article | 12 June 2003 Paper

Adaptability and validity of thin organic bottom antireflective coating (BARC) to sub-90-nm patterning in ArF lithography

Si-Hyun Kim, Si-Hyeung Lee, Gi-Sung Yeo, Jeong Hyeong Lee, Han-Ku Cho, Woo-Sung Han, Joo-Tae Moon

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485117

KEYWORDS: Etching, Reflectivity, Lithography, Chemical reactions, Optical lithography, Line edge roughness, Refractive index, Optical properties, Bottom antireflective coatings, Critical dimension metrology

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Proceedings Article | 27 December 2002 Paper

Simple method for separating and evaluating origins of a side error in mask CD uniformity: photomask blanks and mask-making processes

Yo-Han Choi, Jong-Rak Park, Moon-Gyu Sung, Seung-Hune Yang, Soon-Ho Kim, Ho-June Lee, Jeong-Yun Lee, Il-Yong Jang, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468099

KEYWORDS: Photomasks, Critical dimension metrology, Error analysis, Photoresist processing, Data modeling, Quantitative analysis, Chemically amplified resists, Integrated circuits, Semiconducting wafers, Etching

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Proceedings Article | 27 December 2002 Paper

Analytical approach to X-phenomenon in alternating phase-shifting masks

Jong Rak Park, Soon Ho Kim, Hojune Lee, Il-Yong Jang, Yo-Han Choi, Seung-Hune Yang, Jeong-Yoon Lee, Yong-Hoon Kim, Sung-Woon Choi, Hee-Sun Yoon, Jung-Min Sohn

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.468092

KEYWORDS: Photomasks, Phase shifts, Error analysis, Semiconducting wafers, Fourier transforms, Reticles, Wafer-level optics, Convolution, Image acquisition, Holmium

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Proceedings Article | 11 March 2002 Paper

Extended capability of laser writer for masks beyond 180-nm nodes

Sung-Yong Cho, Jeong-Yun Lee, Chang-Hwan Kim, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458290

KEYWORDS: Critical dimension metrology, Photomasks, Photoresist processing, Scanning electron microscopy, Scattering, Standards development, Phase shifts, Semiconducting wafers, Printing, Optics manufacturing

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Proceedings Article | 11 March 2002 Paper

Analysis of dry etch loading effect in mask fabrication

Jeong-Yun Lee, Sung-Yong Cho, Chang-Hwan Kim, Sung-Woo Lee, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458341

KEYWORDS: Etching, Chromium, Critical dimension metrology, Photomasks, Oxygen, Plasma etching, Dry etching, Mask making, Plasma, Optical proximity correction

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Proceedings Article | 5 September 2001 Paper

Resolution improvement of chemical-amplification resist using process-induced effect correction

Ji-Hyeon Choi, Chang-Hwan Kim, Jeong-Yun Lee, Seong-Yong Moon, Seong-Woon Choi, Woo-Sung Han, Jung-Min Sohn

Proceedings Volume 4409, (2001) https://doi.org/10.1117/12.438359

KEYWORDS: Etching, Dry etching, Critical dimension metrology, Photoresist processing, Chromium, Data modeling, Photomasks, Instrument modeling, Scattering, Diffusion

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Showing 5 of 9 publications

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