Dr. Jeroen Huijbregste
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 27 May 2009 Paper
Proc. SPIE. 7470, 25th European Mask and Lithography Conference
KEYWORDS: Lithography, Reticles, Optical lithography, Contamination, Air contamination, Manufacturing, Pellicles, Humidity, Photomasks, Contamination control

Proceedings Article | 1 April 2009 Paper
Proc. SPIE. 7273, Advances in Resist Materials and Processing Technology XXVI
KEYWORDS: Carbon, Lithography, Sensors, Calibration, Polymers, Ultraviolet radiation, Silicon, Nitrogen, Photoresist materials, Semiconducting wafers

Proceedings Article | 2 June 2003 Paper
Proc. SPIE. 5038, Metrology, Inspection, and Process Control for Microlithography XVII
KEYWORDS: Spatial frequencies, Sensors, Copper, Signal processing, Aluminum, Optical alignment, Scanning probe microscopy, Semiconducting wafers, Overlay metrology, Chemical mechanical planarization

Proceedings Article | 6 September 2000 Paper
Proc. SPIE. 4058, Superconducting and Related Oxides: Physics and Nanoengineering IV
KEYWORDS: Thin films, X-rays, X-ray diffraction, Superconductors, Doping, Atomic force microscopy, Oxygen, Laser ablation, Solids, Strontium

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