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Jerry Lu
at Semiconductor Manufacturing International Corp
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Author
Publications (1)
Proceedings Article | 2 June 2003 Paper
Application of simulation-based defect printability analysis for mask qualification control
Jerry Lu, Alex Lu, Linyong Pang, Don Lee, Jiunn-Hung Chen
Proceedings Volume 5038, (2003) https://doi.org/10.1117/12.485010
KEYWORDS: Optical proximity correction, Photomasks, Semiconducting wafers, Critical dimension metrology, Inspection, Printing, Reticles, Virtual reality, Computer simulations, Semiconductor manufacturing
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