CONFERENCE PROCEEDINGS
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Jerry Lu
at Toppan Chunghwa Electronics Co Ltd
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Author
Publications (4)
Proceedings Article | 15 May 2007 Paper
The effect between absorber profile and wafer print process window in ArF 6% Att. PSM mask
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume 6607, 660736 (2007) https://doi.org/10.1117/12.729025
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, 193nm lithography, Critical dimension metrology, Scanners, Wafer-level optics, Manufacturing, Lutetium, Microelectronics
Proceedings Article | 20 October 2006 Paper
The effect between mask blank flatness and wafer print process window in ArF 6% att. PSM mask
Joseph Tzeng, Booky Lee, Jerry Lu, Makoto Kozuma, Noah Chen, Wen Kuang Lin, Army Chung, Yow Choung Houng, Chi Hung Wei
Proceedings Volume 6349, 634954 (2006) https://doi.org/10.1117/12.692881
KEYWORDS: Photomasks, Semiconducting wafers, Lithography, Chromium, Printing, 193nm lithography, Quartz, Polishing, Lutetium, Microelectronics
Proceedings Article | 20 October 2006 Paper
Study of chromeless mask quartz defect detection capability for 80-nm post structure
Jerry Lu, Boster Wang, Frank Chen, Orion Wang, Jomarch Chou, Orson Lin, Jackie Cheng, Ellison Chen, Paul Yu
Proceedings Volume 6349, 63493K (2006) https://doi.org/10.1117/12.685660
KEYWORDS: Inspection, Photomasks, Defect detection, Quartz, Semiconducting wafers, Reticles, Lithography, Chromium, Resolution enhancement technologies, Manufacturing
Proceedings Article | 20 May 2006 Paper
Advanced hybrid mask process development
Orson Lin, Jomarch Chou, K. K. Fu, Booky Lee, Richard Lu, Jerry Lu, Chiang-Lin Shi
Proceedings Volume 6283, 62831S (2006) https://doi.org/10.1117/12.681754
KEYWORDS: Etching, Photomasks, Chromium, Resolution enhancement technologies, Neodymium, Quartz, Image processing, Diffractive optical elements, Phase shifts, Binary data
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