Ji-Suk Hong
Principal Engineer at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Area of Expertise:
Lithographic DFM , Statistical variability modeling , OPC , Memory cell fail rate modeling
Publications (12)

Proceedings Article | 20 March 2019 Presentation + Paper
Proc. SPIE. 10961, Optical Microlithography XXXII
KEYWORDS: Lithography, Data modeling, Image processing, Neural networks, Photomasks, Image classification, Computational lithography, Binary data, Process modeling

Proceedings Article | 20 March 2018 Presentation + Paper
Proc. SPIE. 10587, Optical Microlithography XXXI
KEYWORDS: Semiconductors, Electronics, Optical lithography, Graphics processing units, Computer simulations, Optical proximity correction, Tolerancing, Communication engineering

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Surface plasmons, Optical lithography, Statistical analysis, Error analysis, Manufacturing, Resistance, Monte Carlo methods, Process control, Critical dimension metrology, Overlay metrology

Proceedings Article | 13 March 2009 Paper
Proc. SPIE. 7275, Design for Manufacturability through Design-Process Integration III
KEYWORDS: Semiconductors, Lithography, Optical lithography, Calibration, Image quality, Photomasks, Image enhancement, Optical proximity correction, Nanoimprint lithography, Semiconducting wafers

Proceedings Article | 14 May 2007 Paper
Proc. SPIE. 6607, Photomask and Next-Generation Lithography Mask Technology XIV
KEYWORDS: Lithography, Data modeling, Data processing, Finite element methods, Design for manufacturing, Photomasks, Optical proximity correction, Critical dimension metrology, Photoresist processing, Process modeling

Showing 5 of 12 publications
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